Method for producing vapor deposition mask, vapor deposition mask preparation body, method for producing organic semiconductor element, method for producing organic EL display, and vapor deposition mask

ABSTRACT

A vapor deposition mask preparation body in which a metal mask is provided on one surface of a resin plate for obtaining a resin mask, and a protective sheet with peel strength not less than about 0.0004 N/10 mm and less than about 0.2 N/10 mm in conformity with JIS Z-0237:2009 is provided on the other surface of the resin plate is prepared, with respect to the vapor deposition mask preparation body, the resin plate is irradiated with laser light from the metal mask side to form a resin mask opening corresponding to a pattern to be produced by vapor deposition in the resin plate, and the protective sheet is peeled off from the resin mask in which the resin mask opening corresponding to the pattern to be produced by vapor deposition is formed.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.16/448,122, filed Jun. 21, 2019, now U.S. Pat. No. 10,651,386, which isa continuation of U.S. application Ser. No. 15/739,844, filed Dec. 26,2017, now U.S. Pat. No. 10,396,283, issued Aug. 27, 2019, which is theNational Stage of International Application No. PCT/JP2016/069250, filedJun. 29, 2016, the entireties of which are incorporated herein byreference.

FIELD OF THE INVENTION

Embodiments of the present disclosure relate to a method for producing avapor deposition mask, a vapor deposition mask preparation body, amethod for producing an organic semiconductor element, a method forproducing an organic EL display, and a vapor deposition mask.

BACKGROUND OF THE INVENTION

With upsizing of products using organic EL elements or increase insubstrate sizes, a demand for upsizing is also growing with respect tovapor deposition masks, and the metal plates for use in production ofthe vapor deposition masks constituted of metals are also upsized.However, with the present metal processing technique, it is difficult toform openings in a large metal plate with high precision, which cannotrespond to enhancement in definition of the openings. Moreover, in thecase of a vapor deposition mask constituted of only a metal, the massthereof also increases with upsizing, and the total mass including aframe also increases, which becomes a hindrance to handling.

Under such circumstances, in Patent Document 1, there is proposed amethod for producing a vapor deposition mask including a metal mask inwhich slits (metal mask openings) are provided and a resin mask which ispositioned on the surface of the metal mask and in which openingscorresponding to a pattern to be produced by vapor deposition arearranged for a plurality of rows in the lengthwise direction and in thecrosswise direction, the metal mask and the resin mask being stacked.According to the method for producing a vapor deposition mask proposedin Patent Document 1, opening precision of the openings of the resinmask by laser irradiation can be improved, and a vapor deposition maskcapable of forming a vapor deposition pattern with high definition canbe produced. Patent Document 2 to Patent Document 4 are documentsrelevant to the method for producing a vapor deposition mask proposed inPatent Document 1.

CITATION LIST Patent Document

-   Patent Document 1: Japanese Patent No. 5288037-   Patent Document 2: Japanese Patent Laid-Open No. 2015-67891-   Patent Document 3: Japanese Patent Laid-Open No. 2014-133938-   Patent Document 4: Japanese Patent Laid-Open No. 2015-67892

SUMMARY OF THE INVENTION Technical Problem

A primary object of an embodiment of the present disclosure is toprovide a method for producing a vapor deposition mask capable of simplyproducing a vapor deposition mask in excellent yield which can satisfyboth high definition and lightweight even in upsizing, to provide avapor deposition mask preparation body used in this method for producinga vapor deposition mask, to provide a method for producing an organicsemiconductor element capable of producing an organic semiconductorelement with excellent precision and a vapor deposition mask, and toprovide a method for producing an organic EL display capable ofproducing an organic EL display with excellent precision.

Solution to Problem

According to an embodiment of the present disclosure, there is provideda method for producing a vapor deposition mask including a metal mask inwhich a metal mask opening is formed and a resin mask in which a resinmask opening corresponding to a pattern to be produced by vapordeposition is formed at a position overlapping with the metal maskopening, the metal mask and the resin mask being stacked, the methodincluding: a step of preparing a vapor deposition mask preparation bodyin which the metal mask is provided on one surface of a resin plate forobtaining the resin mask, and a protective sheet with peel strength notless than about 0.0004 N/10 mm and less than about 0.2 N/10 mm inconformity with JIS Z-0237:2009 is provided on the other surface of theresin plate; a step of irradiating, with respect to the vapor depositionmask preparation body, the resin plate with laser light from the metalmask side to form the resin mask opening corresponding to the pattern tobe produced by vapor deposition in the resin plate; and a step ofpeeling off the protective sheet from the resin mask in which the resinmask opening corresponding to the pattern to be produced by vapordeposition is formed.

Moreover, the vapor deposition mask preparation body may be a vapordeposition mask preparation body in which the metal mask is provided onone surface of a resin plate for obtaining the resin mask, and aplurality of the protective sheets are provided on the other surface ofthe resin plate.

Moreover, according to an embodiment of the present disclosure, there isprovided a vapor deposition mask preparation body for obtaining a vapordeposition mask including a metal mask in which a metal mask opening isformed and a resin mask in which a resin mask opening corresponding to apattern to be produced by vapor deposition is formed at a positionoverlapping with the metal mask opening, the metal mask and the resinmask being stacked, wherein the metal mask is provided on one surface ofa resin plate for obtaining the resin mask, and a protective sheet withpeel strength not less than about 0.0004 N/10 mm and less than about 0.2N/10 mm in conformity with JIS Z-0237:2009 is provided on the othersurface of the resin plate.

Moreover, according to an embodiment of the present disclosure, there isprovided a vapor deposition mask preparation body for obtaining a vapordeposition mask including a metal mask in which a metal mask opening isformed and a resin mask in which a resin mask opening corresponding to apattern to be produced by vapor deposition is formed at a positionoverlapping with the metal mask opening, the metal mask and the resinmask being stacked, wherein a metal plate for obtaining the metal maskis provided on one surface of a resin plate for obtaining the resinmask, and a protective sheet with peel strength not less than about0.0004 N/10 mm and less than about 0.2 N/10 mm in conformity with JISZ-0237:2009 is provided on the other surface of the resin plate.

Moreover, according to an embodiment of the present disclosure, there isprovided a method for producing an organic semiconductor element,including a step of forming a vapor deposition pattern on a vapordeposition target using a frame-equipped vapor deposition mask in whicha vapor deposition mask is fixed to a frame, wherein in the step offorming the vapor deposition pattern, the vapor deposition mask fixed tothe frame is the vapor deposition mask produced by the aforementionedmethod for producing a vapor deposition mask.

Moreover, according to an embodiment of the present disclosure, there isprovided a method for producing an organic EL display, wherein theorganic semiconductor element produced by the aforementioned method forproducing an organic semiconductor element is used.

Moreover, according to an embodiment of the present disclosure, there isprovided a method for producing a vapor deposition mask including ametal mask in which a metal mask opening is formed and a resin mask inwhich a resin mask opening corresponding to a pattern to be produced byvapor deposition is formed at a position overlapping with the metal maskopening, the metal mask and the resin mask being stacked, the methodincluding: a step of preparing a vapor deposition mask preparation bodyin which the metal mask is provided on one surface of a resin plate forobtaining the resin mask, and a protective sheet with self-adsorptionand peelability is adsorbed on the other surface of the resin plate; astep of irradiating, with respect to the vapor deposition maskpreparation body, the resin plate with laser light from the metal maskside to form the resin mask opening corresponding to the pattern to beproduced by vapor deposition in the resin plate; and a step of peelingoff the protective sheet from the resin mask in which the resin maskopening corresponding to the pattern to be produced by vapor depositionis formed.

Moreover, the protective sheet adsorbed on the other surface of theresin plate may be a protective sheet containing any one or both of asilicone-based resin and a urethane-based resin. Moreover, the vapordeposition mask preparation body may be a vapor deposition maskpreparation body in which the metal mask is provided on one surface of aresin plate for obtaining the resin mask, and a plurality of theprotective sheets are adsorbed on the other surface of the resin plate.

Moreover, according to an embodiment of the present disclosure, there isprovided a vapor deposition mask preparation body for obtaining a vapordeposition mask including a metal mask in which a metal mask opening isformed and a resin mask in which a resin mask opening corresponding to apattern to be produced by vapor deposition is formed at a positionoverlapping with the metal mask opening, the metal mask and the resinmask being stacked, wherein the metal mask is provided on one surface ofa resin plate for obtaining the resin mask, and a protective sheet withself-adsorption and peelability is adsorbed on the other surface of theresin plate.

Moreover, according to an embodiment of the present disclosure, there isprovided a vapor deposition mask preparation body for obtaining a vapordeposition mask including a metal mask in which a metal mask opening isformed and a resin mask in which a resin mask opening corresponding to apattern to be produced by vapor deposition is formed at a positionoverlapping with the metal mask opening, the metal mask and the resinmask being stacked, wherein a metal plate for obtaining the metal maskis provided on one surface of a resin plate for obtaining the resinmask, and a protective sheet with self-adsorption and peelability isadsorbed on the other surface of the resin plate.

Moreover, according to an embodiment of the present disclosure, there isprovided a method for producing an organic semiconductor element,including a step of forming a vapor deposition pattern on a vapordeposition target using a frame-equipped vapor deposition mask in whicha vapor deposition mask is fixed to a frame, wherein in the step offorming the vapor deposition pattern, the vapor deposition mask fixed tothe frame is the vapor deposition mask produced by the aforementionedmethod for producing a vapor deposition mask.

Moreover, according to an embodiment of the present disclosure, there isprovided a method for producing an organic EL display, wherein theorganic semiconductor element produced by the aforementioned method forproducing an organic semiconductor element is used.

Moreover, according to an embodiment of the present disclosure, there isprovided a vapor deposition mask including: a metal mask including ametal mask opening; and a resin mask including a resin mask opening, themetal mask being provided on one surface of the resin mask, wherein aprotective sheet with peel strength not less than about 0.0004 N/10 mmand less than about 0.2 N/10 mm in conformity with JIS Z-0237:2009 isprovided on the other surface of the resin mask.

Moreover, according to an embodiment of the present disclosure, there isprovided a vapor deposition mask including: a metal mask including ametal mask opening; and a resin mask including a resin mask opening, themetal mask being provided on one surface of the resin mask, wherein aprotective sheet with self-adsorption and peelability is adsorbed on theother surface of the resin mask.

Advantageous Effects

According to the method for producing a vapor deposition mask accordingto the present disclosure and the vapor deposition mask preparation bodyaccording to the present disclosure, a vapor deposition mask capable ofsatisfying both high definition and lightweight even in upsizing can besimply produced in excellent yield. Moreover, according to the methodfor producing an organic semiconductor element according to the presentdisclosure and the vapor deposition mask, an organic semiconductorelement can be produced with excellent precision. Moreover, according tothe method for producing an organic EL display according to the presentdisclosure, an organic EL display can be produced with excellentprecision.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1(a)-(c) show an example of a method for producing a vapordeposition mask of an embodiment.

FIG. 2 is a schematic cross-sectional view exemplary showing acomparative vapor deposition mask.

FIGS. 3(a)-(b) show expanded elevation views of the vicinity of a resinmask opening as a vapor deposition mask produced using a comparativevapor deposition mask preparation body is seen from the resin mask side.

FIGS. 4(a)-(d) show an example of a method of forming the vapordeposition mask preparation body.

FIG. 5(a) is an elevation view of an exemplary vapor deposition maskpreparation body as seen from the protective sheet 30 side in plan view,and FIG. 5(b) is a schematic cross-sectional view of the vapordeposition mask preparation body in FIG. 5(a).

FIG. 6(a) is an elevation view of an exemplary vapor deposition maskpreparation body as seen from the protective sheet 30 side in plan view,and FIG. 6(b) is a schematic cross-sectional view of the vapordeposition mask preparation body in FIG. 6(a).

FIGS. 7(a) to 7(c) are elevation views of exemplary vapor depositionmask preparation bodies as seen from the protective sheet 30 side inplan view.

FIGS. 8(a)-(d) elevation views exemplarily showing frames.

FIG. 9(a) is an elevation view of a vapor deposition mask produced by amethod for producing a vapor deposition mask of an embodiment as seenfrom the metal mask side in plan view, and FIG. 9(b) is a schematiccross-sectional view taken along the A-A line in FIG. 9(a).

FIG. 10 is an elevation view of a vapor deposition mask of Embodiment(A) as seen from the metal mask side in plan view.

FIG. 11 is an elevation view of a vapor deposition mask of Embodiment(A) as seen from the metal mask side in plan view.

FIG. 12 is an elevation view of a vapor deposition mask of Embodiment(A) as seen from the metal mask side in plan view.

FIGS. 13(a) and 13(b) are elevation views of vapor deposition masks ofEmbodiment (A) as seen from the metal mask side in plan view.

FIG. 14 is an elevation view of a vapor deposition mask of Embodiment(B) as seen from the metal mask side in plan view.

FIG. 15 is an elevation view of a vapor deposition mask of Embodiment(B) as seen from the metal mask side in plan view.

FIG. 16 is an elevation view of a frame-equipped vapor deposition maskas seen from the resin mask side in plan view.

FIG. 17 is an elevation view of a frame-equipped vapor deposition maskas seen from the resin mask side in plan view.

FIGS. 18(a)-(g) show diagrams showing examples of devices includingorganic EL displays.

FIG. 19 is a schematic cross-sectional view of a vapor deposition maskof an embodiment.

DETAILED DESCRIPTION OF THE INVENTION

Hereafter, embodiments of the present invention are described withreference to the drawings and the like. Notably, embodiments of thepresent invention can be implemented in many different modes and shouldnot be construed to be limited to the contents of description ofembodiments exemplified below. Moreover, while in the drawings, thereare cases where widths, thicknesses, shapes of individual parts areschematically presented as compared with those in actual modes for moreclarity of the description, they are merely exemplary, not limitinginterpretation of an embodiment of the present invention. Moreover, inthe specification of the present application and the drawings, elementssimilar to those described regarding already shown drawings aresometimes given the same signs to properly omit their detaileddescription. Moreover, while the description is made using terms such as“upward”, “downward” and the like for convenience of the description,the upward and downward directions may be reversed. The same holds truefor the rightward and leftward directions.

<<Method for Producing Vapor Deposition Mask>>

Hereafter, a method for producing a vapor deposition mask according toan embodiment of the present disclosure is specifically described usingthe drawings. As shown in FIGS. 1 (a)-(c), the method for producing avapor deposition mask according to an embodiment of the presentdisclosure is a method for producing a vapor deposition mask 100including a metal mask 10 in which metal mask openings 15 are formed anda resin mask 20 in which resin mask openings 25 corresponding to apattern to be produced by vapor deposition are formed at positionsoverlapping with the metal mask openings 15, the metal mask and theresin mask being stacked, and includes: as shown in FIG. 1(a), a step ofpreparing a vapor deposition mask preparation body 60 in which the metalmask 10 is provided on one surface of a resin plate 20A for obtainingthe resin mask, and a protective sheet 30 with peel strength not lessthan about 0.0004 N/10 mm and less than about 0.2 N/10 mm in conformitywith JIS Z-0237:2009 is provided on the other surface of the resin plate20A; as shown in FIG. 1(b), a step of irradiating, with respect to thevapor deposition mask preparation body 60, the resin plate 20A withlaser light from the metal mask 10 side to form the resin mask openings25 corresponding to the pattern to be produced by vapor deposition inthe resin plate 20A; and as shown in FIG. 1(c), a step of peeling offthe protective sheet 30 from the resin mask 20 in which the resin maskopenings 25 corresponding to the pattern to be produced by vapordeposition are formed, in other words, a step of peeling off theprotective sheet 30 from the vapor deposition mask 100 which is a finalproduction target.

The peel strength stated in the specification of the present applicationis a synonym of 180° peel adhesive force in conformity with JISZ-0237:2009, and measurement of the peel strength can be performed inconformity with (Method 2): 180° Peel Adhesive Force with Respect toBack Surface in JIS Z-0237:2009. Specifically, using a test plateobtained by pasting a test tape (polyimide film (polyimide tape 5413, 3MJapan Limited) having a pressure-sensitive adhesive agent on itssurface) on a stainless steel plate such that the stainless steel plateand the pressure-sensitive adhesive agent oppose each other, aprotective sheet as a test piece is pasted on this polyimide film of thetest plate, peel strength (relative to polyimide) in the occasion whenthe protective sheet as the test piece is peeled off at 180° from thepolyimide film as the test plate is measured by the method in conformitywith JIS Z-0237:2009, and thereby, the peel strength of the protectivesheet can be measured. As a measurement machine which performsmeasurement of the peel strength, an electromechanical universal testinginstrument (5900 series, Instron Japan Company Limited) is to be used.

Before the individual steps are described, a predominance of the methodfor producing a vapor deposition mask according to an embodiment of thepresent disclosure is described, exemplified by a case where a vapordeposition mask is produced using a “comparative vapor deposition maskpreparation body 60A” that does not satisfy a requirement for the vapordeposition mask preparation body 60 used in the method for producing avapor deposition mask according to an embodiment of the presentdisclosure. Notably, as shown in FIG. 2, the “comparative vapordeposition mask preparation body 60A” is different from the vapordeposition mask preparation body 60 (refer to FIG. 1(a)) used in themethod for producing a vapor deposition mask according to an embodimentof the present disclosure only in that the protective sheet 30 is notprovided on the other surface of the resin plate 20A.

Formation of resin mask openings in the resin plate 20A of the“comparative vapor deposition mask preparation body” and formation ofthe resin mask openings 25 in the resin plate 20A of the vapordeposition mask preparation body 60 used in the method for producing avapor deposition mask according to an embodiment of the presentdisclosure are performed by irradiating the resin plate 20A with laserlight from the metal mask 10 side to decompose the resin plate 20A.

Here, focusing on the stage of the middle of formation of the resin maskopenings 25 under the resin plate 20A of the “comparative vapordeposition mask preparation body” being irradiated with laser light, inother words, the stage where recess parts to be the resin mask openings25 in the final stage exist in the resin plate 20A, with the laserprocessing under irradiation with laser light progressing, the thicknessfrom the bottom surface of the resin plate 20A to the bottom surfaces ofthe recess parts becomes thin, and strength of the recess parts and theresin plate 20A near the recess parts is decreasing. With this decreasein strength, immediately before formation of the resin mask openings 25,parts of the resin plate 20A tend to be chipped off, causing “burrs” and“rubble”. Moreover, with the thickness from the bottom surface of theresin plate 20A to the bottom surfaces of the recess parts becomingthin, “burrs” and “rubble” caused by out-of-focus blur tend to arise.Specifically, due to out-of-focus blur, decomposition of the resin plate20A with laser light is not normally performed, the case where “burrs”arise in edge parts of the resin mask openings 25 arises, and parts ofthe resin plate 20A that have not completely decomposed tend to remainas “rubble”. Notably, the “rubble” stated in the specification of thepresent application is a synonym of “debris”.

Moreover, when the “comparative vapor deposition mask preparation body”is placed on a processing stage 70 to form the resin mask openings 25 inthe resin plate 20A of the “comparative vapor deposition maskpreparation body”, some gap is to exist between the processing stage 70and the resin plate 20A of the “comparative vapor deposition maskpreparation body”, and this gap is also a factor of out-of-focus blur inthe occasion of irradiation with laser light. Notably, in order to makethe gap between the processing stage 70 and the resin plate 20A of the“comparative vapor deposition mask preparation body” small, in otherwords, to improve close contact between the processing stage 70 and theresin plate 20A of the “comparative vapor deposition mask preparationbody”, various adsorption methods such, for example, as electrostaticadsorption, vacuum adsorption, and a method of adsorption with a magnetcan be used. However, these adsorption methods are not preferablebecause there arises the case where smoothness of the resin plate 20A ofthe “comparative vapor deposition mask preparation body” deteriorates,adsorption parts are damaged by irradiation with laser light, orpartially (microscopically), parts where the resin plate 20A and theprocessing stage 70 are not brought in complete close contact with eachother arise.

The “burrs” and the “rubble” arising in forming the resin mask openings25 in the resin plate 20A of the “comparable vapor deposition maskpreparation body” tend to protrude toward the inner circumference sideof the resin mask openings 25 as shown in FIG. 3(a) and/or, to stickonto the surface of the resin mask 20 on the side that is not in contactwith the metal mask 10 as shown in FIG. 3(b). In the case where the“burrs” and the “rubble” as shown in FIG. 3(a) arise, when forming avapor deposition pattern on a vapor deposition target using the producedvapor deposition mask, the “burrs” and the “rubble” block a vapordeposition material released from a vapor deposition source, whichcauses an insufficient pattern to be formed on the vapor depositiontarget, that is, so-called pattern defects to arise. Although in orderto perform pattern vapor deposition with excellent precision on thevapor deposition target using the vapor deposition mask, the vapordeposition mask and the vapor deposition target are needed to be insufficient close contact with each other, when the “burrs” and the“rubble” as shown in FIG. 3(b) arise, poor close contact between thevapor deposition mask and the vapor deposition target arises, whichcauses pixel blur and the like to arise. Notably, FIGS. 3(a)-(b) areexpanded elevation views of the vicinity of the resin mask opening 25 asthe vapor deposition mask produced using the “comparative vapordeposition mask preparation body” is seen from the resin mask side inplan view.

<Step of Preparing Vapor Deposition Mask Preparation Body>

Therefore, in the method for producing a vapor deposition mask accordingto an embodiment of the present disclosure, as the vapor deposition maskpreparation body including the resin plate 20A for forming the resinmask openings 25 by irradiation with laser light, the vapor depositionmask preparation body 60 in which the metal mask 10 is provided on onesurface of the resin plate 20A and the protective sheet 30 with peelstrength not less than about 0.0004 N/10 mm and less than about 0.2 N/10mm in conformity with JIS Z-0237:2009 is provided on the other surfaceof the resin plate 20A is used. In other words, as the vapor depositionmask preparation body 60 for obtaining the vapor deposition mask 100,the vapor deposition mask preparation body 60 that includes thefollowing (Feature 1) and (Feature 2) is used.

(Feature 1): The metal mask 10 is provided on one surface of the resinplate 20A for obtaining the resin mask 20, and the protective sheet 30is provided on the other surface of the resin plate 20A.

(Feature 2): In the vapor deposition mask preparation body 60 exhibitingthe configuration of the aforementioned (Feature 1), the peel strength,in conformity with JIS Z-0237:2009, of the protective sheet provided onthe other surface of the resin plate 20A is not less than about 0.0004N/10 mm and less than about 0.2 N/10 mm.

According to the vapor deposition mask preparation body 60 with thesefeatures (in particular, the aforementioned (Feature 1)), when the resinplate 20A of the vapor deposition mask preparation body 60 is irradiatedwith laser light to decompose the resin plate 20A and to form the resinmask openings 25, “burrs” and “rubble” can be suppressed from arising.Thereby, the vapor deposition mask 100 which can form a vapor depositionpattern with high definition can be obtained. Specifically, theprotective sheet 30 provided on the other surface of the resin plate 20Aenables out-of-focus blur in the occasion when the resin plate 20A isirradiated with laser light to form the resin mask openings 25 to besuppressed, and “burrs” and “rubble” caused by insufficientdecomposition of the resin plate 20A due to out-of-focus blur can besuppressed from arising. Moreover, according to the vapor depositionmask preparation body 60 with these features (in particular, theaforementioned (Feature 1)), for example, even in the case where a gaparises between the processing stage 70 and the vapor deposition maskpreparation body 60 when the vapor deposition mask preparation body 60is placed on the processing stage 70 to form the resin mask openings 25,out-of-focus blur in the occasion when the resin plate 20A is irradiatedwith laser light to form the resin mask openings 25 can be suppressed.

Moreover, according to the vapor deposition mask preparation body 60with the aforementioned features (in particular, the aforementioned(Feature 1)), in addition to suppression of out-of-focus blur in theoccasion when the resin mask openings 25 are formed in the resin plate20A, the strength of the resin plate 20A itself can be enhanced, andalso thereby, “burrs” and “rubble” can be suppressed from arising.Specifically, with the presence of the protective sheet 30 provided onthe other surface of the resin plate 20A, the strength of the recessparts to be the resin mask openings 25 in the final stage and the resinplate 20A near the recess parts can be prevented from deteriorating.Specifically, when it is assumed that the protective sheet 30 is a resinplate, an apparent thickness of the resin plate 20A can be increased. Inother words, the protective sheet 30 serves to prevent out-of-focusblur, and in addition, serves as a support body for preventing thestrength of the resin plate from deteriorating. Notably, by preventingthe strength of the recess parts to be the resin mask openings 25 in thefinal stage and the resin plate 20A near the recess parts fromdeteriorating with the protective sheet 30 provided on the other surfaceof the resin plate 20A, in the stage of forming the resin mask openingsin the resin plate 20A by irradiation with laser light, parts of theresin plate 20A can be suppressed from being chipped off or undergoingsimilar action.

Notably, in the case where the resin mask openings 25 are formed in theresin plate 20A in the state where the vapor deposition mask preparationbody is fixed to a frame in order to reduce a positioning error of theframe to the vapor deposition mask, when this vapor deposition maskpreparation body is the “comparative vapor deposition mask preparationbody” in which the protective sheet 30 is not adsorbed on the othersurface of the resin plate 20A, the resin plate 20A of the “comparativevapor deposition mask preparation body” and the processing stage 70cannot be brought into close contact with each other due to the presenceof the frame in the occasion of irradiation with laser light, and whenthe resin mask openings 25 are formed in the state of being fixed to theframe, an extent of out-of-focus blur is large. On the other hand, inthe method for producing a vapor deposition mask according to anembodiment of the present disclosure, even when a gap exists between thevapor deposition mask preparation body 60 and the processing stage 70,due to the presence of the protective sheet 30 adsorbed on the othersurface of the resin plate 20A, out-of-focus blur can be prevented fromarising in the occasion when the resin mask openings 25 are formed inthe resin plate 20A.

In other words, according to the method for producing a vapor depositionmask according to an embodiment of the present disclosure with theaforementioned features (in particular, the aforementioned (Feature 1)),“burrs” and “rubble” can be suppressed from arising in the occasion whenthe resin mask openings 25 are formed in the resin plate 20A, and theresin mask openings 25 can be formed in the resin plate 20A withexcellent precision.

Furthermore, in the method for producing a vapor deposition maskaccording to an embodiment of the present disclosure, since the vapordeposition mask preparation body 60 with (Feature 2) as well as theaforementioned (Feature 1) is used, in a step of peeling off theprotective sheet 30 from the vapor deposition mask preparation body 60mentioned later, the resin plate 20A can be suppressed from beingdamaged, and the protective sheet 30 can be suppressed from beingunintentionally peeled off before the step of peeling off the protectivesheet 30.

In the method for producing a vapor deposition mask according to anembodiment of the present disclosure, as the aforementioned (Feature 2),that the protective sheet 30 with peel strength not less than about0.0004 N/10 mm and less than about 0.2 N/10 mm in conformity with JISZ-0237:2009 is provided on the other surface of the resin plate 20A isthe essential condition. In other words, that as the protective sheet 30provided on the other surface of the resin plate 20A, the protectivesheet 30 with peel strength not less than about 0.0004 N/10 mm and lessthan about 0.2 N/10 mm in conformity with JIS Z-0237:2009 is used is theessential condition. A reason is that in the case where a protectivesheet with peel strength not less than about 0.2 N/10 mm in conformitywith JIS Z-0237:2009 is provided on the other surface of the resin plate20A, when this protective sheet is peeled off from the resin plate 20A,the resin plate 20A is damaged, in other word, the resin plate 20Asuffers high stress, and changes in dimension and position of the resinmask openings 25 formed in the resin plate 20A arise. Moreover, anotherreason is that peeling traces and the like tend to arise in the resinplate 20A. On the other hand, still another reason is that in the casewhere a protective sheet with peel strength less than about 0.0004 N/10mm in conformity with JIS Z-0237:2009 is provided on the other surfaceof the resin plate 20A, the protective sheet is unintentionally peeledoff before the step of peeling off the protective sheet.

In the vapor deposition mask preparation body in a preferable mode, aprotective sheet with peel strength not less than about 0.0012 N/10 mmand not more than about 0.012 N/10 mm in conformity with JIS Z-0237:2009is provided on the other surface of the resin plate 20A. In the vapordeposition mask preparation body 60 in a still preferable mode, aprotective sheet with peel strength not less than about 0.002 N/10 mmand not more than about 0.04 N/10 mm in conformity with JIS Z-0237:2009is provided on the other surface of the resin plate 20A. In the vapordeposition mask preparation body 60 in a particularly preferable mode,the protective sheet 30 with peel strength not less than about 0.002N/10 mm and not more than about 0.02 N/10 mm in conformity with JISZ-0237:2009 is provided on the other surface of the resin plate 20A.

While in the above, the case where the resin mask openings 25 are formedin the state where the vapor deposition mask preparation body 60 isplaced on the processing stage 70 is exemplarily described, the methodfor producing a vapor deposition mask according to an embodiment of thepresent disclosure does not take the placement of the vapor depositionmask preparation body 60 on the processing stage 70 as the essentialcondition, but the resin mask openings 25 can also be formed byirradiating the resin plate 20A of the vapor deposition mask preparationbody with laser light, for example, in the state where the vapordeposition mask preparation body 60 is fixed to a frame without thevapor deposition mask preparation body 60 placed on the processing stage70, or by another method other than this.

(Example of Method for Producing Vapor Deposition Mask Preparation Body)

As to the vapor deposition mask preparation body 60 used in the methodfor producing a vapor deposition mask according to an embodiment of thepresent disclosure, there is no limitation to a method for producing thevapor deposition mask preparation body 60 as long as it satisfies theconditions that the metal mask 10 is provided on one surface of theresin plate 20A and that the protective sheet 30 that satisfies theaforementioned (Feature 2) is provided on the other surface of the resinplate 20A.

For example, the vapor deposition mask preparation body 60 can beobtained by preparing the metal mask 10 in which the metal mask openings15 are beforehand formed, pasting this metal mask 10 on the one surfaceof the resin plate 20A by a conventionally known method, for example,using an adhesive agent or the like, and pasting the protective sheet 30directly on the other surface of the resin plate 20A, or indirectlythereon using an adhesive agent or the like such that the condition ofthe aforementioned (Feature 2) is satisfied. Notably, after theprotective sheet 30 is provided on the other surface of the resin plate20A, the metal mask 10 may be pasted on the one surface of the resinplate 20A. Moreover, in place of pasting the protective sheet 30directly on the resin plate 20A or indirectly thereon, a layer to be theprotective sheet 30 may be formed on the resin plate 20A using variousprinting methods or the like.

Moreover, a metal plate for obtaining the metal mask 10 may be preparedto paste this metal plate on the one surface of the resin plate 20A, toform the metal mask openings 15 that penetrate only the metal plate, andthen, to provide the protective sheet 30 on the other surface of theresin plate 20A such that the condition of the aforementioned (Feature2) is satisfied. To paste the resin plate 20A and the protective sheet30 together may be performed before the resin plate 20A and the metalplate are pasted together, or may by performed in the stage before themetal mask openings 15 are formed and after the resin plate 20A and themetal plate are pasted together. In other words, to paste the resinplate 20A and the protective sheet 30 together may be performed in anystage as long as it is performed before the resin mask openings 25 areformed in the resin plate 20A.

FIGS. 4(a) to 4(d) are schematic cross-sectional views exemplarilyshowing a method of forming the vapor deposition mask preparation body60, and in a mode shown in the figure, after the resin plate 20A isprovided on the metal plate 10A, the metal mask openings 15 are formedin the metal plate 10A, and after that, a protective sheet is providedon the surface of the resin plate 20A on the side that is not in contactwith the metal mask. Notably, an arbitrary layer may be provided betweenthe resin plate 20A and the protective sheet 30 so as to satisfy theaforementioned (Feature 2).

As a method of forming the resin plate 20A on the metal plate 10A, amethod of coating and drying of coating liquid obtained by dispersing ordissolving a resin which is a material of the resin plate 20A in anappropriate solvent by a conventionally known coating method, and thelike can be cited. Moreover, the resin plate 20A may be pasted on themetal plate 10A via an adhesive later or the like. In the method, asshown in FIG. 4(a), after the resin plate 20A is provided on the metalplate 10A, the surface of the metal plate 10A is coated with a resistmaterial 62, and the resist material is masked using a mask 63 in whicha metal mask opening pattern is formed, and is exposed and developed.Thereby, as shown in FIG. 4(b), a resist pattern 64 is formed on thesurface of the metal plate 10A. Then, using the resist pattern 64 as anetching resistant mask, etching processing is performed only on themetal plate 10A, and the resist pattern is cleaned and removed after theetching. Thereby, as shown in FIG. 4(c), a stacked body in which themetal mask 10 configured by forming the metal mask openings 15 in themetal plate 10A is provided on one surface of the resin plate 20A isobtained. Next, as shown in FIG. 4(d), the protective sheet 30 is pastedon the other surface of the resin plate 20A of the obtained stackedbody, or a layer which is to be the protective sheet 30 is formedthereon using various printing methods, and thereby, the vapordeposition mask preparation body 60 is obtained.

A masking method of the resist material is not specially limited but, asshown in FIG. 4(a), only the surface side, of the metal plate 10A, thatis not in contact with the resin plate 20A may be coated with the resistmaterial 62, or the individual surfaces of the resin plate 20A and themetal plate 10A may be coated (not shown) with the resist material 62.Moreover, a dry film method of pasting dry film resist on the surface,of the metal plate 10A, that is not in contact with the resin plate 20A,or on the individual surfaces of the resin plate 20A and the metal plate10A can also be used. A coating method of the resist material 62 is notspecially limited but, in the case where only the surface side, of themetal plate 10A, that is not in contact with the resin plate 20A iscoated with the resist material 62, a spin coating method or a spraycoating method can be used. Meanwhile, when the resin plate 20A and themetal plate 10A are stacked into a long sheet, a dip coating method orthe like which can perform coating with a resist material in aroll-to-roll scheme is preferably used. Notably, in the dip coatingmethod, the individual surfaces of the resin plate 20A and the metalplate 10A are to be coated with the resist material 62.

The resist material used is preferably excellent in processablity withdesired resolution. Moreover, an etching agent used in the etchingprocessing is not specially limited but a known etching agent only hasto be properly selected.

An etching method of the metal plate 10A is not specially limited but,for example, wet etching methods such as a spray etching method ofspraying an etching agent from an injection nozzle at predeterminedinjection pressure, a dip etching method in an etching solution filledwith an etching agent, and a spin etching method of dropping an etchingagent, and dry etching methods using gas, plasma and the like can beused.

(Protective Sheet)

The protective sheet 30 provided on the other surface of the resin plate20A only has to be able to satisfy the condition of the aforementioned(Feature 2), and, in other words, there is no limitation to conditionsother than this as long as it satisfies the condition that theprotective sheet includes peel strength not less than about 0.0004 N/10mm and less than about 0.2 N/10 mm in conformity with JIS Z-0237:2009.

The protective sheet 30(i) may be directly provided on the other surfaceof the resin plate 20A, or (ii) may be indirectly provided on the othersurface of the resin plate 20A via an arbitrary layer, so as to satisfythe condition of the aforementioned (Feature 2).

As the protective sheet 30 directly provided on the other surface of theresin plate 20A, the protective sheet 30 whose surface includesself-adsorption or self-adhesion can be cited.

The self-adsorption of the protective sheet 30 stated here means aproperty with which, by a mechanism of the protective sheet 30 itself,it can be adsorbed on the other surface of the resin plate 20A, andspecifically, means a property with which it can be brought into closecontact onto the other surface of the resin plate 20A, not via anadhesive agent, a pressure-sensitive adhesive agent or the like betweenthe other surface of the resin plate 20A and the protective sheet, andwithout need for an external mechanism such, for example, as attractionwith a magnet or the like between the resin plate 20A and the protectivesheet. According to such a protective sheet 30 with self-adsorption, inthe occasion when it comes into contact with the resin plate 20A, theprotective sheet 30 can be adsorbed onto the resin plate 20A whilecausing air to escape.

As the protective sheet 30 with self-adsorption, for example, theprotective sheet 30 on which self-adsorption is expressed due to actionof a resin material itself constituting the protective sheet 30 can beused.

Such a resin material of the protective sheet 30 is not speciallylimited but a material with which peel strength in the occasion when theprotective sheet 30 is peeled off from the resin plate 20A can satisfythe condition of the aforementioned (Feature 2) can be properly selectedand used. Examples of the protective sheet 30 include, as a resin whichcan express self-adsorption, an acrylic resin, a silicone-based resin, aurethane-based resin, a polyester resin, an epoxy resin, a polyvinylalcohol resin, a cycloolefin resin, a polyethylene resin and the like,and therewith, peel strength in the occasion when the protective sheet30 is peeled off from the resin plate 20A satisfies the condition of theaforementioned (Feature 2). Also for a resin material of the protectivesheet including a cell suction cup structure mentioned later, theseresin materials can be used. Notably, the protective sheet 30 may solelycontain one type of resin, or may contain two or more types of resins.For example, peel strength of the protective sheet 30 can also beadjusted so as to satisfy the condition of the aforementioned (Feature2) using a combination of resin materials with high peelability. Thesame holds true for the protective sheets 30 in various modes mentionedlater. Moreover, as the protective sheet 30 in which the resin materialitself includes adsorption, for example, a sheet-like object and thelike in which a material itself includes adsorption, which is disclosedin Japanese Patent Laid-Open No. 2008-36895, can also be used.

Moreover, in place of the aforementioned protective sheet 30 withself-adsorption due to action of the resin material itself, theprotective sheet 30 whose surface includes a cell suction cup structuremay be used. Also in the case of using the protective sheet 30 includingthe cell suction cup structure, that peel strength in the occasion whenthe protective sheet 30 is peeled off from the resin plate 20A satisfiesthe condition of the aforementioned (Feature 2) is the condition. Thecell suction cup structure means a continuous fine roughness structureformed on the surface, and self-adsorption is given the protective sheet30 by this continuous fine roughness structure acting as suction cups.As such a protective sheet 30, for example, a sheet-like object and thelike including the cell suction cup structure can be cited, which isdisclosed in Japanese Patent Laid-Open No. 2008-36895.

By performing adhesion processing on the surface of the protective sheet30 on the side that is contact with the resin plate 20A,pressure-sensitive adhesion (sometimes also referred to as adhesion) canalso be expressed on the protective sheet 30. As the adhesionprocessing, for example, corona discharge processing, firing processing,ozone processing, ultraviolet light processing, radiation processing,roughness processing, chemical processing, plasma processing, lowtemperature plasma processing, primer processing, grafting processingand the like can be cited.

In place of the protective sheet 30 directly provided on the othersurface of the resin plate 20A, the protective sheet 30 may beindirectly provided on the other surface of the resin plate 20A via alayer including adhesion or pressure-sensitive adhesion (hereinaftersometimes referred to as intermediate layer). Notably, also in modes inwhich the protective sheet 30 is indirectly provided, that peel strengthin the occasion when the protective sheet 30 is peeled off from theresin plate 20A takes satisfaction of the aforementioned (Feature 2) asthe essential condition.

When the protective sheet 30 itself does not include self-adsorption orself-adhesion, the intermediate layer serves to bring the resin plate20A and the protective sheet 30 into close contact with each other. Inother words, as the intermediate layer, a layer including adhesion orpressure-sensitive adhesion is used. Moreover, in the case where theprotective sheet 30 is directly provided on the other surface of theresin plate 20A, when the condition of the aforementioned (Feature 2)cannot be satisfied, the intermediate layer can also be provided betweenthe resin plate 20A and the protective sheet 30, as a layer foradjusting peel strength in the occasion when the protective sheet 30 ispeeled off from the resin plate 20A. Notably, as to the intermediatelayer for adjusting peel strength, for example, in the case where peelstrength in the occasion when the protective sheet 30 is peeled off isnot less than about 0.2 N/10 mm when the protective sheet 30 is directlyprovided on the other surface of the resin plate 20A, it may beprovided, as a layer for lowering this peel strength, between the resinplate 20A and the protective sheet 30, and in the case where peelstrength in the occasion when the protective sheet 30 is peeled off isless than about 0.0004 N/10 mm, it may be provided, as a layer forincreasing this peel strength, between the resin plate 20A and theprotective sheet 30.

The intermediate layer may exhibit a single layer configurationconstituted of one layer, or may exhibit a stacking configuration havingtwo or more layers stacked. For example, an intermediate layer obtainedby stacking an adhesive layer for bringing the resin plate 20A and theprotective sheet 30 into close contact with each other, and a peel-offlayer for adjusting peel strength in the occasion when the protectivesheet is peeled off in this order from the resin plate 20A side may beprovided between the resin plate 20A and the protective sheet 30.

The intermediate layer may be a layer which is peeled off from the resinplate 20A along with the protective sheet 30 when the protective sheet30 is peeled off from the resin plate 20A, or may be a layer whichremains on the resin plate 20A side. Notably, in the step of forming theresin mask openings 25 by irradiating the resin plate 20A with laserlight, when the protective sheet 30 and the intermediate layer aredecomposed with the laser light, since these can become new generationsources of “burrs” and “rubble”, the protective sheet 30 and theintermediate layer are preferably not decomposed or hardly decomposedwith laser light as mentioned later. Notably, when an intermediate layerthat is not decomposed or hardly decomposed with laser light is set, anda configuration in which the intermediate layer remains on the resinplate 20A side in the step of peeling off the protective sheet 30 fromthe resin plate 20A is set, the remaining intermediate layer is to closethe resin mask openings 25 formed in the resin plate 20A, which is notpreferable. With this point taken into consideration, the material ofthe intermediate layer is preferably not decomposed or hardly decomposedwith laser light, can preferably satisfy the condition of theaforementioned (Feature 2) of peel strength in the occasion when theprotective sheet 30 is peeled off from the resin plate 20A, and canpreferably make its close contact with the protective sheet 30 higherthan its close contact with the resin plate 20A. According to such amode, the protective sheet 30 can be peeled off from the resin plate 20Aalong with the intermediate layer.

As the protective sheet 30 indirectly provided on the other surface ofthe resin plate 20A, for example, various plastic films or sheets ofpolyester such as poly(ethylene telephthalate), polyarylate,polycarbonate, polyurethane, polyimide, polyether imide, cellulosederivatives, polyethylene, ethylene-vinyl acetate copolymers,polypropylene, polystyrene, acrylics, polyvinyl chloride, polyvinylidenechloride, polyvinyl alcohol, polyvinyl butyral, nylon,polyetheretherketone, polysulfone, polyethersulfon,tetrafluoroethylene-perfluoroalkyl vinyl ether, polyvinylfluoride,tetrafluoroethylene-ethylene, tetrafluoroethylene-hexafluoropropylene,polychlorofluoroethylene, polyvinylidene fluoride and the like can becited.

As the material of the intermediate layer, for example, an acrylicresin, a vinyl chloride-based resin, a vinyl acetate-based resin, avinyl chloride/vinyl acetate copolymer resin, a polyester-based resin, apolyamide-based resin and the like can be cited.

The thickness of the intermediate layer is not specially limited but ispreferably within a range not less than about 1 μm and not more thanabout 50 μm, still preferably within a range not less than about 3 μmand not more than about 20 μm.

A method of forming the intermediate layer is not specially limited but,for example, it can be formed by coating and drying, on the othersurface of the resin plate 20A, of a coating liquid for an intermediatelayer which liquid is obtained by dissolving or dispersing, in anappropriate solvent, one or two or more resin materials with which peelstrength in the occasion when the protective sheet 30 is peeled off fromthe resin plate 20A can satisfy the aforementioned (Feature 2), and inaddition, an additive which is added as needed. Moreover, in place ofthe method of forming the intermediate layer by coating, pasting of apressure-sensitive adhesive sheet or the like with which peel strengthin the occasion when the protective sheet 30 is peeled off from theresin plate 20A can satisfy the aforementioned (Feature 2) can also formthe intermediate layer.

The protective sheet 30 provided on the intermediate layer may be formedby pasting, on the intermediate layer, a protective sheet or aprotective film with which peel strength in the occasion when theprotective sheet 30 is peeled off from the resin plate 20A can satisfythe aforementioned (Feature 2), or may be formed by coating and drying,on the other surface of the resin plate 20A, of coating liquid obtainedby dissolving or dispersing, in an appropriate solvent, one or two ormore resin materials with which peel strength in the occasion when theprotective sheet 30 is peeled off from the resin plate 20A can satisfythe aforementioned (Feature 2), and in addition, an additive which isadded as needed.

The protective sheet 30 in preferable modes includes about 70% or moreof transmittance at a wavelength of laser light for forming the resinmask openings 25 in the resin plate 20A, preferably about 80% or morethereof, regardless of the protective sheet 30 directly provided on theresin plate 20A or indirectly provided thereon via an intermediate layeror the like. Moreover, when the protective sheet 30 is indirectlyprovided on the resin plate 20A via the intermediate layer, theintermediate layer as well as the protective sheet 30 preferablyincludes about 70% or more of transmittance at a wavelength of laserlight for forming the resin mask openings 25 in the resin plate 20A,particularly about 80% or more thereof. According to the protectivesheet 30 in preferable modes, in the occasion of irradiation with laserlight to form the resin mask openings 25 in the resin plate 20A, theintermediate layer and the protective sheet 30 can be suppressed frombeing decomposed with this laser light. Thereby, various problems causedby decomposition of the intermediate layer and the protective sheet 30,for example, that “rubble” arising due to decomposition of theintermediate layer and the protective sheet 30 causes sticking orsimilar action onto the inner wall surfaces of the resin mask openings25 formed in the resin plate 20A, can be suppressed. Notably, thewavelength of laser light is different depending on types of laser lightused, and, for example, when a polyimide resin is used as the materialof the resin plate 20A, YAG laser, excimer laser or the like is used.Notably, for fine processing, YAG laser (third harmonic generation) with355 nm of wavelength of laser light, and excimer laser (KrF) with 248 nmof wavelength of laser light are suitable. Accordingly, when theprotective sheet 30 is selected, the material of the protective sheet 30only has to be properly selected such that the transmittance of laserlight is the aforementioned preferable transmittance in accordance witha type of laser used. Moreover, as a method of setting the transmittanceof the protective sheet 30 that can satisfy the condition of theaforementioned (Feature 2) to the aforementioned preferabletransmittance, measures of adjusting the thickness of the protectivesheet 30, specifically, a method of making the thickness of theprotective sheet 30 thin, and a method of using a resin material or thelike high in transparency as the resin material of the protective sheet30, can be cited.

The thickness of the protective sheet 30 is not specially limited butpreferably not less than about 1 μm and not more than about 100 μm,still preferably not less than about 2 μm and not more than about 75 μm,further preferably not less than about 2 μm and not more than about 50μm, particularly preferably within a range not less than about 3 μm andnot more than about 30 μm. By setting the thickness of the protectivesheet 30 to be not less than about 1 μm, strength of the protectivesheet 30 can be sufficiently enhanced, and when the resin mask openingsare formed by irradiating the resin plate 20A with laser light, risks orthe like that the protective sheet 30 breaks or that the protectivesheet 30 suffers cracks can be reduced. In particular, when thethickness of the protective sheet 30 is set to be not less than about 3μm, these risks can be further reduced.

Moreover, as the protective sheet 30, a support member-integratedprotective sheet (not shown) in which the protective sheet 30 issupported on a support member can also be used. With the supportmember-integrated protective sheet, even when the thickness of theprotective sheet 30 itself is made thin, handling ability and the likeof the protective sheet 30 can be made excellent. The thickness of thesupport member is not specially limited but can be properly set inaccordance with the thickness of the protective sheet 30, preferably notless than about 3 μm and not more than about 200 μm, still preferablynot less than about 3 μm and not more than about 150 μm, furtherpreferably not less than about 3 μm and not more than about 100 μm,particularly preferably not less than about 10 μm and not more thanabout 75 μm.

The material of the support member is not specially limited but a resinmaterial, a glass material and the like can be used, and the resinmaterial is preferably used in view of flexibility and the like.

The protective sheet 30 is provided on the other surface of the resinplate 20A and at a position overlapping with the resin mask openings 25formed in the resin plate 20A in the final stage in the thicknesswisedirection. On the other surface of the resin plate 20A, one protectivesheet 30 may be provided, or a plurality of protective sheets 30 may beprovided. In a mode shown in FIGS. 5(a) and 5(b), one protective sheet30 is provided on the other surface of the resin plate 20A. Notably,FIG. 5(a) is an elevation view of an exemplary vapor deposition maskpreparation body 60 as seen from the protective sheet 30 side, and FIG.5(b) is a schematic cross-sectional view thereof. While in the modeshown in FIGS. 5(a)-(b), the length of the protective sheet 30 in thecrosswise direction (horizontal direction in the figure) is made shorterthan the length of the resin plate 20A in the crosswise direction, thelength of the protective sheet 30 in the crosswise direction may be setto be the same length as the length of the resin plate 20A in thecrosswise direction, and the end face of the protective sheet 30 maycoincide with the end face of the resin plate 20A in planar position, orthe length of the protective sheet 30 in the crosswise direction may beset to be longer than the length of the resin plate 20A in the crosswisedirection, and the outer circumference of the protective sheet 30 may becaused to protrude from the resin plate 20A. The same holds true for thelength of the protective sheet 30 in the lengthwise direction. Moreover,the same holds true for protective sheets 30 in various modes mentionedlater.

As shown in FIGS. 6(a) and 6(b), as to the protective sheet 30 in apreferable mode, a plurality of protective sheets 30 are provided on theother surface of the resin plate 20A. According to this mode, even whenupsizing the resin plate 20A, in other words, even when upsizing thevapor deposition mask 100 produced in the final stage, the protectivesheets 30 can be simply provided on the other surface of the resin plate20A. In particular, when the protective sheet 30 is a protective sheet30 with self-adsorption, as the dimension of the protective sheet 30becomes larger, a risk that air remains between the resin plate 20A andthe protective sheet 30 becomes larger, but by dividing the protectivesheet 30 into a plurality of pieces to make the dimension thereofsmaller, the risk that air or the like remains between the other surfaceof the resin plate 20A and each protective sheet 30 can be reduced,which can simply enhance close contact between the resin plate 20A andthe protective sheet 30. Moreover, even when, due to a human error orthe like in the occasion when the protective sheet 30 is pasted on theresin plate 20A, there arises a need to peel off the protective sheet 30having been provided on the other surface of the resin plate 20A beforethe step of forming the resin mask openings 25 in the resin plate 20A,only the protective sheet 30 of interest is needed to be peeled off,which is preferable also in view of work efficiency.

The dimension or the like of the protective sheet 30 in the case where aplurality of protective sheets 30 are provided on the other surface ofthe resin plate 20A is not specially limited but, for example, it may bea dimension with which one or a plurality of resin mask openings 25 ofresin mask openings formed in the final stage can be covered, or may bea dimension with which “one screen” mentioned later or a plurality ofscreens can be covered. As to the protective sheet 30 in a preferablemode, each of the plurality of protective sheets 30 includes a dimensionwith which it overlaps with the “one screen” or the plurality of screensformed in the resin plate 20A in the final stage. In particular, sinceas to a vapor deposition mask in a preferable mode mentioned later, aninterval between the screens is wider than an interval between the resinmask openings 25, in view of workability, the protective sheet 30preferably includes a dimension with which it covers the “one screen” orthe plurality of screens, and is preferably provided at a positionoverlapping with the “one screen” or the plurality of screens in thethicknesswise direction. Notably, in FIGS. 6(a)-(b), each regionenclosed by a dotted line is an arrangement scheduled region of the “onescreen”.

While in the mode shown in FIGS. 6(a)-(b), the plurality of protectivesheets 30 are regularly provided in the lengthwise direction and thecrosswise direction of the vapor deposition mask preparation body (thevertical direction and the horizontal direction in the figure) as thevapor deposition mask preparation body 60 is seen from the protectivesheet 30 side in plan view, as shown in FIG. 7(a), a plurality ofprotective sheets 30 extending in the lengthwise direction may beprovided in the crosswise direction, or as shown in FIG. 7(b), aplurality of protective sheets 30 extending in the crosswise directionmay be provided in the lengthwise direction. Moreover, as shown in FIG.7(c), a plurality of protective sheets 30 may be alternately provided atrandom.

<Step of Forming Resin Mask Opening>

As shown in FIG. 1(b), this step is a step of irradiating, with respectto the vapor deposition mask preparation body 60 prepared above, theresin plate 20A with laser light through the metal mask openings 15 fromthe metal mask 10 side to form the resin mask openings 25 correspondingto a pattern to be produced by vapor deposition in the resin plate 20A.Notably, while in the mode shown in the figure, irradiation with laserlight is performed with respect to the vapor deposition mask preparationbody 60 placed on the processing stage 70, the processing stage 70 is anarbitrary configuration in the method for producing a vapor depositionmask according to an embodiment of the present disclosure, and the resinmask openings 25 may be formed without the vapor deposition maskpreparation body 60 placed on the processing stage 70.

A laser apparatus used in this step is not specially limited but aconventionally known laser apparatus is sufficient to be used. Moreover,the pattern to be produced by vapor deposition in the specification ofthe present application means a pattern to be produced using the vapordeposition mask, and, for example, when the vapor deposition mask isused for forming an organic layer of an organic EL element, it is theshape of the organic layer.

<Step of Fixing Vapor Deposition Mask Preparation Body to Frame>

The method for producing a vapor deposition mask according to anembodiment of the present disclosure may include a step of fixing thevapor deposition mask preparation body 60 to a frame, between arbitrarysteps before forming the resin mask openings 25, or after these steps.While this step is an arbitrary step in the method for producing a vapordeposition mask of an embodiment of the present invention, by beforehandfixing the vapor deposition mask preparation body 60 to a frame in thestage before irradiation with laser light to form the resin maskopenings 25 in the resin plate 20A, an attachment error arising infixing the obtained vapor deposition mask 100 to a frame can be madezero. Notably, in place of fixing the vapor deposition mask preparationbody 60 to a frame, after fixing, to a frame, a stacked body in whichthe metal mask 10 is provided on one surface of the resin plate 20A, ora stacked body in which the metal plate 10A for obtaining the metal maskis provided on one surface of the resin plate 20A, the protective sheet30 may be provided on the other surface of the resin plate 20A in thestacked body.

Fixation of the vapor deposition mask preparation body to a frame may beperformed on the surface of the frame or may be performed on the lateralface of the frame.

Notably, while when laser processing is performed in the state where thevapor deposition mask preparation body 60 is fixed to a frame, dependingon the fixing mode of the vapor deposition mask preparation body 60 tothe frame, a gap arises between the vapor deposition mask preparationbody 60 and the processing stage 70, or a gap microscopically arises dueto insufficient close contact between the vapor deposition maskpreparation body 60 and the processing stage 70, since in the vapordeposition mask preparation body 60, the protective sheet 30 is providedon the other surface of the resin plate 20A, the presence of theprotective sheet 30 enables deterioration in strength of the resin plate20A and out-of-focus blur that can arise due to the gap between theresin plate 20A and the processing stage 70 to be prevented.Accordingly, the method for producing a vapor deposition mask accordingto an embodiment of the present disclosure is particularly preferable inthe case where the resin mask openings 25 are formed in the state wherethe vapor deposition mask preparation body 60 is fixed to a frame.

As shown in FIG. 8(a), the frame 40 is a substantially rectangular framemember and includes a through hole for exposing the resin mask openings25 provided in the resin mask 20 of the vapor deposition mask 100obtained in the final stage to the vapor deposition source side. Thematerial of the frame is not specially limited but a metal materiallarge in rigidity such, for example, as SUS, an invar material or aceramic material can be used. Above all, a metal frame is preferable inview of its easy welding to the metal mask of the vapor deposition maskand small influence of deformation and the like.

The thickness of the frame is not specially limited but is preferablywithin a range not less than about 10 mm and not more than about 30 mmin view of rigidity and the like. The width between the innercircumferential end face of the opening of the frame and the outercircumferential end face of the frame is not specially limited as longas it is a width with which the metal mask of the vapor deposition maskcan be fixed to the frame, for example, a width within a range not lessthan about 10 mm and not more than about 70 mm can be exemplarily cited.

Moreover, as shown in FIGS. 8(b) to 8(d), as the frame 40, the frame 40in which reinforcement frames 45 and the like are provided in the regionof the through hole may be used so as not to disturb exposure of theresin mask openings 25 formed in the resin plate 20A. In other words, aconfiguration in which the opening included in the frame 40 is dividedby the reinforcement frames and the like may be included. To provide thereinforcement frames 45 also enables the frame 40 and the vapordeposition mask preparation body 60 to be fixed to each other using thereinforcement frames 45. Specifically, when a plurality of vapordeposition mask preparation bodies 60 described above are arranged andfixed in the lengthwise direction and the crosswise direction, the vapordeposition mask preparation body 60 can be fixed to the frame 40 also atpositions where the reinforcement frames and the vapor deposition maskpreparation bodies 60 overlap with each other.

A method for fixing the frame 40 and the vapor deposition maskpreparation body 60 to each other is not specially limited but thefixation can be performed using spot welding of fixation with laserlight or the like, an adhesive agent, screw fastening, or another methodother than these.

<Step of Peeling Off Protective Sheet>

As shown in FIG. 1(c), this step is a step of peeling off and removingthe protective sheet 30 from the resin mask 20 after the resin maskopenings 25 are formed in the resin plate 20A of the vapor depositionmask preparation body 60 to obtain the resin mask 20. In other words, itis a step of peeling off and removing the protective sheet 30 from thevapor deposition mask. Via this step, the vapor deposition mask 100including the metal mask 10 in which the metal mask openings are formedand the resin mask 20 in which the resin mask openings 25 correspondingto a pattern to be produced by vapor deposition are formed at positionsoverlapping with the metal mask openings 15, the metal mask and theresin mask being stacked, is obtained.

As described above, since in the method for producing a vapor depositionmask according to an embodiment of the present disclosure, theprotective sheet 30 with peel strength not less than about 0.0004 N/10mm and less than about 0.2 N/10 mm in conformity with JIS Z-0237:2009 isprovided on the other surface of the resin plate 20A, the protectivesheet 30 can be peeled off simply from the resin mask 20 in which theresin mask openings 25 are formed only by lifting the protective sheet30 without other separate processing such, for example, as dissolvingprocessing or UV processing for removing the protective sheet. Moreover,by setting the upper limit value of the peel strength to be less thanabout 0.2 N/10 mm, stress on the resin plate 20A can be suppressed frombeing exerted when peeling off the protective sheet 30.

Notably, when the protective sheet with peel strength not less thanabout 0.2 N/10 mm in conformity with JIS Z-0237:2009 is provided on theother surface of the resin plate 20A, stress exerted on the resin plate20A is too high, which causes dimension displacement and positionaldisplacement to tend to arise in the resin mask openings 25 formed inthe resin plate 20A in the step of forming the resin mask openings.Moreover, peeling traces and the like tend to arise on the other surfaceof the resin plate 20A.

Moreover, even when in the step of forming the resin mask openings 25,“rubble” of the resin plate 20A sticks to the surface and the like ofthe protective sheet 30 due to decomposition of the resin plate 20A,this “rubble” can be peeled off and removed in this step along with theprotective sheet 30. Moreover, in the case where the protective sheet 30with self-adsorption is used as the protective sheet 30, the surface ofthe resin plate 20A (resin mask 20) in which the resin mask openings 25are formed is not contaminated with the material of the protective sheet30 and the like when the protective sheet 30 is peeled off from theresin plate 20A, and cleaning processing or the like is not needed.

According to the method for producing a vapor deposition mask accordingto an embodiment of the present disclosure described above, the presenceof the protective sheet 30 enables a vapor deposition mask including theresin mask 20 including the resin mask openings 25 with high definitionand the metal mask, the resin mask and the metal mask being stacked, tobe produced in an excellent yield.

Next, predominance of the method for producing a vapor deposition maskaccording to an embodiment of the present disclosure, the methodincluding: forming resin mask openings in the resin plate 20A withrespect to the vapor deposition mask preparation body in which aprotective sheet with peel strength not less than about 0.0004 N/10 mmand less than about 0.2 N/10 mm in conformity with JIS Z-0237:2009 isprovided on the other surface of the resin plate 20A of the vapordeposition mask preparation body 60; and, after that, peeling off theprotective sheet from a resin mask in which the resin mask opening havebeen formed, is described.

Each support member-integrated protective sheet presented in Table 1below (samples 1 to 7) was pasted on the other surface of a resin plateof a vapor deposition mask preparation body such that the resin plateand the protective sheet opposed each other, the resin mask openings 25were formed by irradiation with laser light from the metal mask side,and laser durability of the protective sheet and the presence or absenceof burrs and rubble, in this stage, were examined. Moreover, after thelaser processing, peelability in the occasion when the protective sheetwas peeled off from the resin plate (resin mask in which the resin maskopenings were formed) was also examined. Notably, for sample A, theresin mask openings were formed in the resin plate without providing aprotective sheet. Moreover, for samples 6 and 7, only evaluation ofpeelability was performed.

In each vapor deposition mask preparation body used, a metal mask (invarmaterial, 40 μm of thickness) in which metal mask openings were formedwas provided on one surface of a resin plate (polyimide resin, 5 μm ofthickness), and each support member-integrated protective sheetpresented in Table 1 below was provided on the other surface of theresin plate. For laser processing, YAG laser with 355 nm of wavelengthwas used. Table 1 below presents thicknesses of a support member and aprotective sheet constituting each support member-integrated protectivesheet, and the transmittance of each protective sheet at 355 nm ofwavelength. Measurement of peel strength was in conformity with JISZ-0237:2009, and was performed by using a test plate obtained by pastinga test tape (polyimide film (polyimide tape 5413, 3M Japan Limited)having a pressure-sensitive adhesive agent on its surface) on astainless steel plate such that the stainless steel plate and thepressure-sensitive adhesive agent opposed each other, pasting eachprotective sheet as a test piece (samples 1 to 7) on this polyimide filmof the test plate, and measuring peel strength (relative to polyimide)in the occasion when the protective sheet as the test piece was peeledoff at 180° from the polyimide film as the test plate with anelectromechanical universal testing instrument (5900 series, InstronJapan Company Limited). Table 1 presents the evaluation results.

Moreover, in order to show relation between the thickness of theprotective sheet provided on the other surface of the resin plate 20Aand damage that the protective sheet suffered in the laser processing,sample B was set by forming a layer with 1 μm of thickness and 1% oftransmittance at 355 nm of wavelength (layer not includingself-adsorption) on the other surface of the resin plate 20A by coating.Moreover, sample C was set by forming a layer with 0.5 μm of thicknessand 1% of transmittance at 355 nm of wavelength (layer not includingself-adsorption) on the other surface of the resin plate 20A by coating.For these samples B and C, evaluation of the presence or absence ofburrs and rubble, and durability of the coating layer in the laserprocessing were performed. Notably, as the material of the coatinglayer, a polyimide resin (PHOTONEECE DL-1602, Toray Industries Inc.) wasused.

Report of Tests

a) Name of the Standard: JIS Z-0237:2009

b) Test Method: Method 2, the tape was a polyimide tape 5413 (3M JapanLimited)

c) Identification of Samples: Product Numbers (Product Names) presentedin the table

d) Test Date and Test Site: Sep. 3 and Dec. 7, 2015, Kashiwa City, ChibaPrefecture

e) Test Results: Interface Breakage

Miscellaneous) Measurement Apparatus: Electromechanical UniversalTesting Instrument (5900 series, Instron Japan Company Limited)

As apparent from the results in Table 1 below, according to samples 1 to5 for which the resin mask openings were formed in the resin plate 20Awith respect to the vapor deposition mask preparation body in which theprotective sheet 30 was provided on the other surface of the resin plate20A, as compared with sample A for which the resin mask openings wereformed in the resin plate 20A without providing the protective sheet 30on the other surface of the resin plate 20A, burrs and rubble could besuppressed from arising, and the resin mask openings with highdefinition could be formed. Moreover, as compared with sample 7 forwhich a protective sheet with peel strength being about 0.2 N/10 mm inconformity with JIS Z-0237:2009 was provided on the other surface of theresin plate 20A, according to 1 to 6 for which a protective sheet withpeel strength not less than about 0.0004 N/10 mm and less than about 0.2N/10 mm in conformity with JIS Z-0237:2009 was provided on the othersurface of the resin plate 20A, damage which the resin mask sufferedcould be suppressed. Moreover, for sample B for which a coating layerwith 1 μm of thickness was provided in place of the protective sheetwith self-adsorption, cracks arose in the coating layer in laserprocessing, and for sample C for which a coating layer with 0.5 μm ofthickness was provided, the coating layer broke in laser processing.Moreover, for samples B and C for which the transmittance was set to beless than about 70%, the coating layer was processed with laser light bythe coating layer absorbing the laser light, which caused burrs andrubble due to this to slightly arise.

TABLE 1 Protective Sheet Peel Force (Relative to Thickness TransmittancePolyimide) Resin Material (μm) (355 nm)(%) N/10 mm Support Member Sample1 Urethane- UA-3004ASL 7 83 0.008 PET Based Sumiron Co. 38 μm Ltd.Sample 2 Urethane- MASTACK 10 83 0.016 PET Based ZUPF-5001 50 μmFujimori Kogyo Co. Ltd. Sample 3 Acrylic EC-9000ASL 7 82 0.024 PETSumiron 38 μm Co. Ltd. Sample 4 Silicone- FIXFILM STD1 25 79 0.004 PETBased Fujicopian 25 μm Co. Ltd. Sample 5 Acrylic MASTACK PC- 4 82 0.04PET 542PA 50 μm Fujimori Kogyo Co. Ltd. Sample 6 Acrylic EC-625 — — 0.1Polyethylene Sumiron 55 μm (including Co. Ltd. Thickness of ProtectiveSheet) Sample 7 Acrylic PP40-R-KG2 — — 0.2 Polypropylene Nichiei 40 μmKakoh Co. Ltd. Sample A Without Protective Sheet Sample B Coating Layerwithout 1 1 — — Self-Adsorption Sample C Coating Layer without 0.5 1 — —Self-Adsorption Laser Durability (Presence or Presence or Absence ofAbsence of Adsorption/Air Deformation of Burrs and Escape AbilityProtective Sheet) Rubble Peelability Sample 1 OK/Remaining No BreakageNone Excellent Air Cracks (Little) Sample 2 OK/Remaining No BreakageNone Excellent Air Cracks (Little) Sample 3 OK/Remaining No BreakageNone Damage on Air Cracks Resin Mask (Medium) (Little) Sample 4OK/Remaining No Breakage None Excellent Air Cracks (None) Sample 5OK/Remaining No Breakage Slight Burrs Damage on Air Cracks and RubbleResin Mask (Much) Arise (Little) Sample 6 OK/Remaining — — Damage on AirResin Mask (Little) (Medium) Sample 7 OK/Remaining — — Damage on AirResin Mask (Little) (Much) Sample A — — Many Burrs — and Rubble AriseSample B — Cracks Arise in Slight Burrs Disability Coating Layer andRubble of Peeling- Arise Off Sample C — Coating Layer Slight BurrsDisability Breaks and Rubble of Peeling- Arise Off<<Method for Producing Vapor Deposition Mask>>

Next, a method for producing a vapor deposition mask according toanother embodiment of the present disclosure is specifically describedusing the drawings. The method for producing a vapor deposition maskaccording to another embodiment of the present disclosure is a methodfor producing the vapor deposition mask 100 including the metal mask 10in which the metal mask openings 15 are formed and the resin mask 20 inwhich the resin mask openings 25 corresponding to a pattern to beproduced by vapor deposition are formed at positions overlapping withthe metal mask openings 15, the metal mask and the resin mask beingstacked, and includes: as shown in FIG. 1(a), a step of preparing thevapor deposition mask preparation body 60 in which the metal mask 10 isprovided on one surface of the resin plate 20A for obtaining the resinmask, and the protective sheet 30 with self-adsorption and peelabilityis adsorbed on the other surface of the resin plate 20A; as shown inFIG. 1(b), a step of irradiating, with respect to the vapor depositionmask preparation body 60, the resin plate 20A with laser light from themetal mask 10 side to form the resin mask openings 25 corresponding tothe pattern to be produced by vapor deposition in the resin plate 20A;and as shown in FIG. 1(c), a step of peeling off the protective sheet 30from the resin mask 20 in which the resin mask openings 25 correspondingto the pattern to be produced by vapor deposition are formed, in otherwords, a step of peeling off the protective sheet 30 from the vapordeposition mask 100 which is a final production target. Hereafter,differences from the method for producing a vapor deposition maskaccording to an embodiment of the present disclosure described above aremainly described. Notably, unless otherwise noted, the method forproducing a vapor deposition mask according to another embodiment of thepresent disclosure can properly select the contents of the descriptionof the aforementioned method for producing a vapor deposition maskaccording to an embodiment of the present disclosure, and the expressionof “method for producing a vapor deposition mask according to anembodiment of the present disclosure” only has to be replaced by “methodfor producing a vapor deposition mask according to another embodiment ofthe present disclosure”.

<Step of Preparing Vapor Deposition Mask Preparation Body>

In the method for producing a vapor deposition mask according to anotherembodiment of the present disclosure, as the vapor deposition maskpreparation body including the resin plate 20A for forming the resinmask openings 25 by irradiation with laser light, the vapor depositionmask preparation body 60 in which the metal mask 10 is provided on onesurface of the resin plate 20A, and furthermore, the protective sheet 30with self-adsorption is adsorbed on the other surface of this resinplate 20A with its self-adsorption is used. According to the method forproducing a vapor deposition mask according to another embodiment of thepresent disclosure, due to the presence of the protective sheet 30adsorbed on the other surface of the resin plate 20A, out-of-focus blurin irradiating the resin plate 20A with laser light can be prevented,and “burrs” and “rubble” caused by out-of-focus blur can be suppressedfrom arising. For example, even in the case where a gap arises betweenthe processing stage 70 and the vapor deposition mask preparation body60 when the vapor deposition mask preparation body 60 is placed on theprocessing stage 70 to form the resin mask openings 25, out-of-focusblur in irradiating the resin plate 20A with laser light can beprevented.

Moreover, in the method for producing a vapor deposition mask accordingto another embodiment of the present disclosure, since as the protectivesheet 30 constituting the vapor deposition mask preparation body 60, theprotective sheet 30 with self-adsorption is used, the self-adsorptioncan bring the protective sheet 30 in close contact onto the othersurface of the resin plate 20A without a gap. Thereby, out-of-focus blurin the occasion when the resin mask openings 25 are formed in the resinplate 20A can be sufficiently suppressed, which enables the resin maskopenings 25 which can form a vapor deposition pattern with highdefinition to be formed. Moreover, the protective sheet 30 adsorbed ontothe other surface of the resin plate 20A serves to cover the othersurface of the resin plate 20A, even when the resin plate 20A has notbeen sufficiently decomposed, and in the stage where the resin maskopenings 25 are formed in the resin plate 20A, “rubble” of the resinplate 20A arises, the “rubble” can be suppressed from directly stickingonto the other surface of the resin plate 20A.

Furthermore, in the method for producing a vapor deposition maskaccording to another embodiment of the present disclosure in whichmethod the protective sheet 30 with self-adsorption is used as theprotective sheet 30 constituting the vapor deposition mask preparationbody 60, the other surface of the resin plate 20A and the protectivesheet 30 can be brought into close contact with each other withoutdistortion or the like arising in the resin plate 20A. Notably, in thecase where distortion or the like arises in the resin plate 20A when theprotective sheet 30 is brought into close contact with the resin plate20A, this distortion or the like tends to cause dimensional precisionand position precision of the resin mask openings 25 formed in the resinplate 20A to deteriorate.

Moreover, in the method for producing a vapor deposition mask accordingto another embodiment of the present disclosure, strength of recessparts to be the resin mask openings 25 in the final stage and the resinplate 20A near the recess parts can be prevented from deteriorating, andalso in this point, “burrs” and “rubble” can be prevented from arising.Specifically, when it is assumed that the protective sheet 30 is a resinplate, an apparent thickness of the resin plate 20A can be increased. Inother words, the protective sheet 30 serves to prevent out-of-focusblur, and in addition, serves as a support body for preventing thestrength of the resin plate from deteriorating. Notably, by preventingthe strength of the recess parts to be the resin mask openings 25 in thefinal stage and the resin plate 20A near the recess parts fromdeteriorating with the protective sheet 30 provided on the other surfaceof the resin plate 20A, in the stage of forming the resin mask openingsin the resin plate 20A by irradiation with laser light, parts of theresin plate 20A can be suppressed from being chipped off or undergoingsimilar action.

Notably, in the case where the resin mask openings 25 are formed in theresin plate 20A in the state where the vapor deposition mask preparationbody is fixed to a frame in order to reduce a positioning error of theframe to the vapor deposition mask, when this vapor deposition maskpreparation body is the “comparative vapor deposition mask preparationbody” in which the protective sheet 30 is not adsorbed on the othersurface of the resin plate 20A, the resin plate 20A of the “comparativevapor deposition mask preparation body” and the processing stage 70cannot be brought into close contact with each other due to the presenceof the frame in the occasion of irradiation with laser light, and whenthe resin mask openings 25 are formed in the state of being fixed to theframe, an extent of out-of-focus blur is large. On the other hand, inthe method for producing a vapor deposition mask according to anotherembodiment of the present disclosure, even when a gap exists between thevapor deposition mask preparation body 60 and the processing stage 70,due to the presence of the protective sheet 30 adsorbed on the othersurface of the resin plate 20A, out-of-focus blur can be prevented fromarising in the occasion when the resin mask openings 25 are formed inthe resin plate 20A.

Notably, while in the above, the case where the resin mask openings 25are formed in the state where the vapor deposition mask preparation body60 is placed on the processing stage 70 is exemplarily described, themethod for producing a vapor deposition mask according to anotherembodiment of the present disclosure does not take the placement of thevapor deposition mask preparation body 60 on the processing stage 70 asthe essential condition, but the resin mask openings 25 can also beformed by irradiating the resin plate 20A of the vapor deposition maskpreparation body with laser light, for example, in the state where thevapor deposition mask preparation body 60 is fixed to a frame withoutthe vapor deposition mask preparation body 60 placed on the processingstage 70, or by another method other than this.

(Example of Method for Producing Vapor Deposition Mask Preparation Body)

As to the vapor deposition mask preparation body 60 used in the methodfor producing a vapor deposition mask according to another embodiment ofthe present disclosure, there is no limitation to a method for producingthe vapor deposition mask preparation body 60 as long as it satisfiesthe condition that the metal mask 10 is provided on one surface of theresin plate 20A and the protective sheet 30 with self-adsorption isadsorbed on the other surface of the resin plate 20A.

For example, the vapor deposition mask preparation body 60 can beobtained by preparing the metal mask 10 in which the metal mask openings15 are beforehand formed, pasting this metal mask 10 on the one surfaceof the resin plate 20A by a conventionally known method, for example,using an adhesive agent or the like, and adsorbing the protective sheet30 with self-adsorption on the other surface of the resin plate 20A.Notably, after the protective sheet 30 with self-adsorption is adsorbedon the other surface of the resin plate 20A, the metal mask 10 may bepasted on the one surface of the resin plate 20A.

Moreover, a metal plate for obtaining the metal mask 10 may be preparedto paste this metal plate on the one surface of the resin plate 20A, toform the metal mask openings 15 that penetrate only the metal plate, andthen, to adsorb the protective sheet 30 with self-adsorption on theother surface of this resin plate 20A. Notably, the adsorption of theprotective sheet 30 with self-adsorption may be performed before theresin plate 20A and the metal plate are pasted together, or may beperformed in the stage before the metal mask openings 15 are formed andafter the resin plate 20A and the metal plate are pasted together. Inother words, the adsorption of the protective sheet 30 may be performedin any stage as long as it is performed before the resin mask openings25 are formed in the resin plate 20A by irradiation with laser light.

FIGS. 4(a) to 4(d) are schematic cross-sectional views exemplarilyshowing a method of forming the vapor deposition mask preparation body60, and in a mode shown in the figure, after the resin plate 20A isprovided on the metal plate 10A, the metal mask openings 15 are formedin the metal plate 10A, and after that, the protective sheet 30 withself-adsorption is adsorbed on the surface of the resin plate 20A on theside that is not in contact with the metal mask.

As a method of forming the resin plate 20A on the metal plate 10A, amethod of coating and drying of coating liquid obtained by dispersing ordissolving a resin which is a material of the resin plate 20A in anappropriate solvent by a conventionally known coating method, and thelike can be cited. Moreover, the resin plate 20A may be pasted on themetal plate 10A via an adhesive layer or the like. In the method, asshown in FIG. 4(a), after the resin plate 20A is provided on the metalplate 10A, the surface of the metal plate 10A is coated with a resistmaterial 62, and the resist material is masked using a mask 63 in whicha metal mask opening pattern is formed, and is exposed and developed.Thereby, as shown in FIG. 4(b), a resist pattern 64 is formed on thesurface of the metal plate 10A. Then, using the resist pattern 64 as anetching resistant mask, etching processing is performed only on themetal plate 10A, and the resist pattern is cleaned and removed after theetching. Thereby, as shown in FIG. 4(c), a stacked body in which themetal mask 10 configured by forming the metal mask openings 15 in themetal plate 10A is provided on one surface of the resin plate 20A isobtained. Next, as shown in FIG. 4(d), the protective sheet 30 withself-adsorption is adsorbed on the other surface of the resin plate 20Aof the obtained stacked body with its self-adsorption, and thereby, thevapor deposition mask preparation body 60 is obtained.

A masking method of the resist material is not specially limited but, asshown in FIG. 4(a), only the surface side, of the metal plate 10A, thatis not in contact with the resin plate 20A may be coated with the resistmaterial 62, or the individual surfaces of the resin plate 20A and themetal plate 10A may be coated (not shown) with the resist material 62.Moreover, a dry film method of pasting dry film resist on the surface,of the metal plate 10A, that is not in contact with the resin plate 20Aor on the individual surfaces of the resin plate 20A and the metal plate10A can also be used. A coating method of the resist material 62 is notspecially limited but, in the case where only the surface side, of themetal plate 10A, that is not in contact with the resin plate 20A iscoated with the resist material 62, a spin coating method or a spraycoating method can be used. Meanwhile, when the resin plate 20A and themetal plate 10A are stacked into a long sheet, a dip coating method orthe like which can perform coating with a resist material in aroll-to-roll scheme is preferably used. Notably, in the dip coatingmethod, the individual surfaces of the resin plate 20A and the metalplate 10A are to be coated with the resist material 62.

The resist material to be used is preferably excellent in processabilitywith desired resolution. Moreover, an etching agent used in the etchingprocessing is not specially limited but a known etching agent only hasto be properly selected.

An etching method of the metal plate 10A is not specially limited but,for example, wet etching methods such as a spray etching method ofspraying an etching agent from an injection nozzle at predeterminedinjection pressure, a dip etching method in an etching solution filledwith an etching agent, and a spin etching method of dropping an etchingagent, and dry etching methods using gas, plasma and the like can beused.

(Protective Sheet)

The protective sheet 30 constituting the vapor deposition maskpreparation body 60 includes self-adsorption and peelability. Notably,the self-adsorption of the protective sheet 30 stated in thespecification of the present application means a property with which, bya mechanism of the protective sheet 30 itself, it can be adsorbed on theother surface of the resin plate 20A, and specifically, means a propertywith which it can be brought into close contact onto the other surfaceof the resin plate 20A not via an adhesive agent, a pressure-sensitiveadhesive agent or the like between the other surface of the resin plate20A and the protective sheet, and without need for an external mechanismsuch, for example, as attraction with a magnet or the like between theresin plate 20A and the protective sheet. According to such a protectivesheet 30 with self-adsorption, in the occasion when it comes intocontact with the resin plate 20A, the protective sheet 30 can beadsorbed onto the resin plate 20A while causing air to escape. Moreover,the peelability of the protective sheet 30 means a property with whichpeeling-off starts by lifting one end of the protective sheet 30adsorbed on the resin plate 20A, and the protective sheet 30 adsorbed onthe resin plate 20A can be removed by continuing to lift the protectivesheet 30 at an appropriate peel angle. Notably, when peeling off theprotective sheet 30, the protective sheet 30 is preferably lifted at anappropriate peel angle at which deformation does not arise in the resinplate 20A. The appropriate angle is, for example, not less than about45° and not more than about 180°, preferable not less than about 90° andnot more than about 180°.

As the protective sheet 30 with self-adsorption, for example, theprotective sheet 30 on which self-adsorption is expressed due to actionof a resin material itself constituting the protective sheet 30 can beused.

The resin material of the protective sheet 30 is not specially limitedas long as the resin material can express self-adsorption due to actionof the resin material itself, but a conventionally known resin materialwhich can express self-adsorption, such, for example, as an acrylicresin, a silicone-based resin, a urethane-based resin, a polyesterresin, an epoxy resin, a polyvinyl alcohol resin, a cycloolefin resin ora polyethylene resin, can be properly selected and used. Above all,according to the protective sheet 30 containing a silicone-based resinwhich can express self-adsorption, or a urethane-based resin, air escapein the occasion when the protective sheet 30 is adsorbed on the resinplate 20A is excellent, and as compared with the protective sheet 30containing another resin material, the protective sheet 30 can beadsorbed on the resin plate 20A with excellent close contact.Furthermore, according to the protective sheet 30 containing asilicone-based resin which can express self-adsorption, or aurethane-based resin, peel strength between the resin plate 20A and theprotective sheet 30 can be made small, which enables the protectivesheet 30 to be peeled off without damaging the resin plate 20A (resinmask 20) in which the resin mask openings 25 are formed in the finalstage. In this point, a silicone-based resin which can expressself-adsorption, and a urethane-based resin are preferable resinmaterials as the material of the protective sheet 30. Above all, theurethane-based resin, which can afford higher air escape ability ispreferable. Notably, the protective sheet 30 may solely contain one typeof resin, or may contain two or more types of resins. Moreover, as theprotective sheet 30 in which the resin material itself includesadsorption, for example, a sheet-like object and the like in which amaterial itself includes adsorption, which is disclosed in JapanesePatent Laid-Open No. 2008-36895, can also be used.

Moreover, in place of the aforementioned protective sheet 30 withself-adsorption due to action of the resin material itself, theprotective sheet 30 whose surface includes a cell suction cup structuremay be used. The cell suction cup structure means a continuous fineroughness structure formed on the surface, and self-adsorption is givento the protective sheet 30 by this continuous fine roughness structureacting as suction cups. As such a protective sheet 30, for example, asheet-like object and the like including the cell suction cup structurecan be cited, which is disclosed in Japanese Patent Laid-Open No.2008-36895. Notably, as the resin material of the protective sheet 30with the cell suction cup structure, a silicone-based resin and aurethane-based resin are preferable.

The protective sheet 30 includes peelability as well as self-adsorption,and in a step of peeling off the protective sheet 30 mentioned later,the protective sheet 30 can be peeled off and removed from the resinmask 20 in which the resin mask opening 25 corresponding to a pattern tobe produced by vapor deposition are formed without other separateprocessing such, for example, as dissolving processing or UV irradiationprocessing. Notably, when the peelability of the protective sheet 30from the vapor deposition mask preparation body 60 is low, there canarise a risk that the resin plate 20A (resin mask 20) in which the resinmask openings 25 have been formed is damaged in peeling off theprotective sheet 30, which causes precision in dimension, position andthe like of the formed resin mask openings 25 to deteriorate. Moreover,there can arise a risk that peeling traces and the like remain in theresin mask 20 in which the resin mask openings 25 are formed (synonymousto the resin plate 20A in which the resin mask openings are formed).With these points taken into consideration, as the protective sheet 30,a protective sheet with peel strength not less than about 0.0004 N/10 mmand less than about 0.2 N/10 mm in conformity with JIS Z-0237:2009 ispreferably used, a protective sheet with peel strength not less thanabout 0.0012 N/10 mm and not more than about 0.012 N/10 mm is stillpreferably used, a protective sheet with peel strength not less thanabout 0.002 N/10 mm and not more than about 0.04 N/10 mm is furtherpreferably used, and a protective sheet with peel strength not less thanabout 0.002 N/10 mm and not more than about 0.02 N/10 mm is stillfurther preferably used. By setting the vapor deposition maskpreparation body 60 in which the protective sheet 30 with such peelstrength is adsorbed on the other surface of the resin plate 20A, damageon the resin mask 20 in which the resin mask openings 25 are formed inpeeling off the protective sheet 30 from the resin mask 20 in which theresin mask openings 25 are formed, and peeling traces and the likearising in this resin mask 20 can be suppressed.

The protective sheet 30 in preferable modes includes about 70% or moreof transmittance at a wavelength of laser light for forming the resinmask openings 25 in the resin plate 20A, preferably about 80% or morethereof. According to the protective sheet 30 in preferable modes, inthe occasion of irradiation with laser light to form the resin maskopenings 25 in the resin plate 20A, the protective sheet 30 can besuppressed from being decomposed with this laser light. Thereby, variousproblems caused by decomposition of the protective sheet 30, forexample, that “rubble” arising due to decomposition of the protectivesheet 30 causes sticking or similar action onto the inner wall surfacesof the resin mask openings 25 formed in the resin plate 20A, can besuppressed. Notably, the wavelength of laser light is differentdepending on types of laser light used, and, for example, when apolyimide resin is used as the material of the resin plate 20A, YAGlaser, excimer laser or the like is used. Notably, for fine processing,YAG laser (third harmonic generation) with 355 nm of wavelength of laserlight, and excimer laser (KrF) with 248 nm of wavelength of laser lightare suitable. Accordingly, when the protective sheet 30 is selected, thematerial of the protective sheet 30 only has to be properly selectedsuch that the transmittance of laser light is the aforementionedpreferable transmittance in accordance with a type of laser used.Moreover, as a method of setting the transmittance of the protectivesheet 30 containing a silicone-based resin or a urethane-based resinwhich is exemplarily cited as the aforementioned preferable resinmaterial and can express self-adsorption to be within the range of theaforementioned preferable transmittance, a method of making thethickness of the protective sheet 30 containing the silicone-based resinor the urethane-based resin thin can be cited. The same holds true forcases where as the resin material which ca express self-adsorption, aresin material other than the silicone-based resin and theurethane-based resin is used. Moreover, also by using a resin materialor the like that can express self-adsorption and is high intransparency, the transmittance can be adjusted to be with in theaforementioned preferable range.

The thickness of the protective sheet 30 is not specially limited butpreferable not less than about 1 μm and not more than about 100 μm,still preferably not less than about 2 μm and not more than about 75 μm,further preferably not less than about 2 μm and not more than about 50μm, particularly preferably not less than about 3 μm and not more thanabout 30 μm. By setting the thickness of the protective sheet 30 to bewithin the aforementioned preferable range, specifically, by setting thelower limit value of the thickness of the protective sheet 30 to be theaforementioned preferable thickness, trackability of the protectivesheet 30 to the resin plate 20A can be enhanced, and thereby, closecontact between the resin plate 20A and the protective sheet 30 can befurther improved. Moreover, by setting the thickness of the protectivesheet 30 to be not less than about 1 μm, strength of the protectivesheet 30 can be sufficiently enhanced, and when the resin mask openingsare formed by irradiating the resin plate 20A with laser light, risks orthe like that the protective sheet 30 breaks and that the protectivesheet 30 suffers cracks can be reduced. In particular, when thethickness of the protective sheet 30 is set to be not less than about 3μm, these risks can be further reduced. Moreover, by setting the upperlimit value of the thickness of the protective sheet 30 to be theaforementioned preferable thickness, a component constituting theprotective sheet 30 can be sufficiently suppressed from beingtransferred to the resin plate 20A side, and moreover, air escapeability can be further enhanced.

Moreover, as the protective sheet 30, a support member-integratedprotective sheet (not shown) in which the protective sheet 30 issupported on a support member can also be used. With the supportmember-integrated protective sheet, even when the thickness of theprotective sheet 30 itself is made thin, handling ability and the likeof the protective sheet 30 can be made excellent. The thickness of thesupport member is not specially limited but can be properly set inaccordance with the thickness of the protective sheet 30, preferably notless than about 3 μm and not more than about 200 μm, still preferablynot less than about 3 μm and not more than about 150 μm, furtherpreferably not less than about 3 μm and not more than about 100 μm,particularly preferably not less than about 10 μm and not more thanabout 75 μm.

The material of the support member is not specially limited but a resinmaterial, a glass material and the like can be used, and the resinmaterial is preferably used in view of flexibility and the like.

The protective sheet 30 is adsorbed on the other surface of the resinplate 20A and at a position overlapping with the resin mask openings 25formed in the resin plate 20A in the final stage in the thicknesswisedirection. As the protective sheet 30, one protective sheet 30 may besolely used, or a plurality of protective sheets 30 may be used. In amode shown in FIGS. 5(a) and 5(b), one protective sheet 30 is adsorbedon the other surface of the resin plate 20A. Notably, FIG. 5(a) is anelevation view of an exemplary vapor deposition mask preparation body 60as seen from the protective sheet 30 side, and FIG. 5(b) is a schematiccross-sectional view thereof. While in the mode shown in FIGS. 5(a)-(b),the length of the protective sheet 30 in the crosswise direction(horizontal direction in the figure) is made shorter than the length ofthe resin plate 20A in the crosswise direction, the length of theprotective sheet 30 in the crosswise direction may be set to be the samelength as the length of the resin plate 20A in the crosswise direction,and the end face of the protective sheet 30 may coincide with the endface of the resin plate 20A in planar position, or the length of theprotective sheet 30 in the crosswise direction may be set to be longerthan the length of the resin plate 20A in the crosswise direction, andthe outer circumference of the protective sheet 30 may be caused toprotrude from the resin plate 20A. The same holds true for the length ofthe protective sheet 30 in the lengthwise direction. Moreover, the sameholds true for protective sheets 30 in various modes mentioned later.

As shown in FIGS. 6(a) and 6(b), as to the protective sheet 30 in apreferable mode, a plurality of protective sheets 30 are adsorbed on theother surface of the resin plate 20A. According to this mode, even whenupsizing the resin plate 20A, in other words, even when upsizing thevapor deposition mask 100 produced in the final stage, a risk that airremains between the other surface of the resin plate 20A and eachprotective sheet 30 can be reduced by downsizing the dimension of eachprotective sheet 30, which can simply enhance close contact between theresin plate 20A and the protective sheet 30. Furthermore, even when, inthe occasion when the protective sheet 30 is adsorbed on the othersurface of the resin plate 20A, air remains between the resin plate 20Aand partial protective sheets 30 out of the plurality of protectivesheets 30, only the protective sheets 30 on which the air and the likeremains are needed to be adsorbed again on the other surface of theresin plate 20A, which is preferable also in view of work efficiency.

The dimension or the like of the protective sheet 30 in the case where aplurality of protective sheets 30 are adsorbed is not specially limitedbut, for example, it may be a dimension with which one or a plurality ofresin mask openings 25 of resin mask openings formed in the final stagecan be covered, or may be a dimension with which “one screen” mentionedlater or a plurality of screens can be covered. As to the protectivesheet 30 in a preferable mode, each of the plurality of protectivesheets 30 includes a dimension with which it overlaps with the “onescreen” or the plurality of screens formed in the resin plate 20A in thefinal stage. In particular, since as to a vapor deposition mask in apreferable mode mentioned later, an interval between the screens iswider than an interval between the resin mask openings 25, in view ofworkability, the protective sheet 30 preferable includes a dimensionwith which it covers the “one screen” or the plurality of screens, andis preferably adsorbed at a position overlapping with the “one screen”or the plurality of screens in the thicknesswise direction. Notably, inFIGS. 6(a)-(b), each region enclosed by a dotted line is an arrangementscheduled region of the “one screen”.

While in the mode shown in FIGS. 6(a)-(b), the plurality of protectivesheets 30 are regularly adsorbed in the lengthwise direction and thecrosswise direction of the vapor deposition mask preparation body (thevertical direction and the horizontal direction in the figure) as thevapor deposition mask preparation body 60 is seen from the protectivesheet 30 side in plan view, as shown in FIG. 7(a), a plurality ofprotective sheets 30 extending in the lengthwise direction may beadsorbed in the crosswise direction, or as shown in FIG. 7(b), aplurality of protective sheet 30 extending in the crosswise directionmay be adsorbed in the lengthwise direction. Moreover, as shown in FIG.7(c), a plurality of protective sheets 30 may be alternately adsorbed atrandom.

<Step of Forming Resin Mask Opening>

As shown in FIG. 1(b), this step is a step of irradiating, with respectto the vapor deposition mask preparation body 60 prepared above, theresin plate 20A with laser light through the metal mask openings 15 fromthe metal mask 10 side to form the resin mask openings 25 correspondingto a pattern to be produced by vapor deposition in the resin plate 20A.Notably, while in the mode shown in the figure, irradiation with laserlight is performed with respect to the vapor deposition mask preparationbody 60 placed on the processing stage 70, the processing stage 70 is anarbitrary configuration in the method for producing a vapor depositionmask according to another embodiment of the present disclosure, and theresin mask openings 25 may be formed without the vapor deposition maskpreparation body 60 placed on the processing stage 70.

A laser apparatus used in this step is not specially limited but aconventionally known laser apparatus is sufficient to be used. Moreover,the pattern to be produced by vapor deposition in the specification ofthe present application means a pattern to be produced using the vapordeposition mask, and, for example, when the vapor deposition mask isused for forming an organic layer of an organic EL element, it is theshape of the organic layer.

<Step of Fixing Vapor Deposition Mask Preparation Body to Frame>

The method for producing a vapor deposition mask according to anotherembodiment of the present disclosure may include a step of fixing thevapor deposition mask preparation body 60 to a frame, between arbitrarysteps before forming the resin mask openings 25, or after these steps.While this step is an arbitrary step in the method for producing a vapordeposition mask of an embodiment of the present invention, by beforehandfixing the vapor deposition mask preparation body 60 to a frame in thestage before irradiation with laser light to form the resin maskopenings 25 in the resin plate 20A, an attachment error arising infixing the obtained vapor deposition mask 100 to a frame can be madezero. Notably, in pace of fixing the vapor deposition mask preparationbody 60 to a frame, after fixing, to a frame, a stacked body in whichthe metal mask 10 is provided on one surface of the resin plate 20A, ora stacked body in which the metal plate 10A for obtaining the metal maskis provided on one surface of the resin plate 20A, the protective sheet30 with self-adsorption may be adsorbed on the other surface of theresin plate 20A in the stacked body.

Fixation of the vapor deposition mask preparation body to a frame may beperformed on the surface of the frame or may be performed on the lateralface of the frame.

Notably, while when laser processing is performed in the state where thevapor deposition mask preparation body 60 is fixed to a frame, dependingon the fixing mode of the vapor deposition mask preparation body 60 tothe frame, a gap arises between the vapor deposition mask preparationbody 60 and the processing stage 70, or a gap microscopically arises dueto insufficient close contact between the vapor deposition maskpreparation body 60 and the processing stage 70, since the vapordeposition mask preparation body 60 takes a configuration in which theprotective sheet 30 is adsorbed on the other surface of the resin plate20A, the presence of the protective sheet 30 enables deterioration instrength of the resin plate 20A and out-of-focus blur that can arise dueto the gap between the resin plate 20A and the processing stage 70 to beprevented. Accordingly, the method for producing a vapor deposition maskaccording to another embodiment of the present disclosure isparticularly preferable in the case where the resin mask openings 25 areformed in the state where the vapor deposition mask preparation body 60is fixed to a frame. As the frame, the frame described for theaforementioned method for producing a vapor deposition mask according toan embodiment of the present disclosure can be properly selected andused, and its detailed description is herein omitted.

<Step of Peeling Off Protective Sheet>

As shown in FIG. 1(c), this step is a step of peeling off and removingthe protective sheet 30 from the resin mask 20 after the resin maskopenings 25 are formed in the resin plate 20A of the vapor depositionmask preparation body to obtain the resin mask 20. In other words, it isa step of peeling off and removing the protective sheet 30 from thevapor deposition mask. Via this step, the vapor deposition mask 100including the metal mask 10 in which the metal mask openings are formedand the resin mask 20 in which the resin mask openings 25 correspondingto a pattern to be produced by vapor deposition are formed at positionsoverlapping with the metal mask openings 15, the metal mask and theresin mask being stacked, is obtained.

As described above, since the protective sheet 30 includes peelability,the protective sheet 30 can be peeled off simply from the resin mask 20in which the resin mask openings 25 are formed only by lifting theprotective sheet 30 without other separate processing such, for example,as dissolving processing or UV processing for removing the protectivesheet. Moreover, since the protective sheet 30 is adsorbed on the othersurface of the resin plate 20A with its self-adsorption, the surface ofthe resin plate 20A (resin mask 20) in which the resin mask openings 25are formed is not contaminated with the material of the protective sheet30 and the like, and cleaning processing or the like is not needed.

According to the method for producing a vapor deposition mask accordingto another embodiment of the present disclosure described above, thepresence of the protective sheet 30 enables a vapor deposition maskincluding the resin mask 20 including the resin mask openings 25 withhigh definition and the metal mask, the resin mask and the metal maskbeing stacked, to be produced in an excellent yield.

Next, predominance of the method for producing a vapor deposition maskaccording to another embodiment of the present disclosure by whichmethod resin mask openings are formed in the resin plate 20A in thestate where the protective sheet 30 with self-adsorption is pasted onthe other surface of the resin plate 20A of the vapor deposition maskpreparation body 60 is described.

Each support member-integrated protective sheet presented in Table 2below (samples (1-1) to (1-7)) was pasted on the other surface of aresin plate of a vapor deposition mask preparation body such that theresin plate and the protective sheet opposed each other, the resin maskopenings 25 were formed by irradiation with laser light from the metalmask side, and adsorption and air escape ability between the resin plate20A and the protective sheet, durability of the protective sheet inlaser processing, and the presence or absence of burrs and rubble, inthis stage, were examined. Moreover, after the laser processing,peelability in the occasion when the support member-integratedprotective sheet was peeled off from the resin plate (resin mask inwhich the resin mask openings were formed) was also examined. Notably,for sample (1-A), the resin mask openings were formed in the resin platewithout providing a support member-integrated protective sheet.Moreover, for samples (1-6) and (1-7), only evaluations of adsorption,air escape ability and peelability were performed.

In each vapor deposition mask preparation body used, a metal mask (invarmaterial, 40 μm of thickness) in which metal mask openings were formedwas provided on one surface of a resin plate (polyimide resin, 5 μm ofthickness), and each support member-integrated protective sheetpresented in Table 2 below was provided on the other surface of theresin plate. For laser processing, YAG laser with 355 nm of wavelengthwas used. Table 2 below presents thicknesses of a support member and aprotective sheet constituting each support member-integrated protectivesheet, and the transmittance of each protective sheet at 355 nm ofwavelength. Measurement of peel strength was in conformity with JISZ-0237:2009, and was performed by using a test plate obtained by pastinga test tape (polyimide film (polyimide tape 5413, 3M Japan Limited)having a pressure-sensitive adhesive agent on its surface) on astainless steel plate such that the stainless steel plate and thepressure-sensitive adhesive agent opposed each other, pasting eachprotective sheet as a test piece (samples (1-1) to (1-7)) on thispolyimide film of the test plate, and measuring peel strength (relativeto polyimide) in the occasion when the protective sheet as the testpiece was peeled off at 180° from the polyimide film as the test platewith an electromechanical universal testing instrument (5900 series,Instron Japan Company Limited). Table 2 presents the evaluation results.

Moreover, in order to show relation between the thickness of theprotective sheet provided on the other surface of the resin plate 20Aand damage that the protective sheet suffered in the laser processing,sample (1-B) was set by forming a layer with 1 μm of thickness and 1% oftransmittance at 355 nm of wavelength (layer not includingself-adsorption) on the other surface of the resin plate 20A by coating.Moreover, sample (1-C) was set by forming a layer with 0.5 μm ofthickness and 1% of transmittance at 355 nm of wavelength (layer notincluding self-adsorption) on the other surface of the resin plate 20Aby coating. For these samples (1-B) and (1-C), evaluation of thepresence or absence of burrs and rubble, and durability of the coatinglayer in the laser processing were performed. Notably, as the materialof the coating layer, a polyimide resin (PHOTONEECE DL-1602, TorayIndustries Inc.) was used.

Report of Tests

a) Name of the Standard: JIS Z-0237:2009

b) Test Method: Method 2, the tape was a polyimide tape 5413 (3M JapanLimited)

c) Identification of Samples: Product Numbers (product Names) presentedin the table

d) Test Date and Test Site: Sep. 3 and Dec. 7, 2015, Kashiwa City, ChibaPrefecture

e) Test Results: Interface Breakage

Miscellaneous) Measurement Apparatus: Electromechanical UniversalTesting Instrument (5900 series, Instron Japan Company Limited)

As apparent from the results in Table 2 below, according to samples(1-1) to (1-5) for which the resin mask openings were formed in theresin plate 20A with respect to the vapor deposition mask preparationbody in which the protective sheet 30 was provided on the other surfaceof the resin plate 20A, as compared with sample (1-A) for which theresin mask openings were formed in the resin plate 20A without providingthe protective sheet 30 on the other surface of the resin plate 20A,burrs and rubble could be suppressed from arising, and the resin maskopenings with high definition could be formed. Moreover, by using theprotective sheet with self-adsorption as the protective sheet 30, afterthe resin mask openings were formed, the protective sheet could besimply peeled off. In particular, for samples (1-1), (1-2) and (1-4) forwhich the protective sheets constituted of a urethane-based resin and asilicone-based resin were used as the protective sheets withself-adsorption, extremely excellent results in evaluation of air escapeability and peelability could be obtained. Moreover, as compared withsample (1-7) for which the protective sheet with peel strength not lessthan about 0.2 N/10 mm was used, for samples (1-1) to (1-6) for whichthe protective sheets with peel strength less than about 0.2 N/10 mmwere used, damage on the resin mask in peeling off the protective sheetcould be reduced. Moreover, according to samples (1-1) to (1-5) forwhich the protective sheets with peel strength not more than about 0.04N/10 mm were used, particularly according to samples (1-1), (1-2) and(1-4) for which the protective sheets with peel strength not more thanabout 0.02 N/10 mm were used, damage which the resin mask suffered inpeeling-off could be further reduced. Moreover, for sample (1-B) forwhich a coating layer with 1 μm of thickness was provided in place ofthe protective sheet with self-adsorption, cracks arose in the coatinglayer in laser processing, and for sample C for which a coating layerwith 0.5 μm of thickness was provided, the coating layer broke in laserprocessing. Moreover, for samples B and C for which the transmittancewas set to be less than about 70%, the coating layer was processed withlaser light by the coating layer absorbing the laser light, which causedburrs and rubble due to this to slightly arise.

TABLE 2 Protective Sheet Peel Force (Relative to Thickness TransmittancePolyimide) Resin Material (μm) (355 nm)(%) N/10 mm Support Member Sample1-1 Urethane- UA-3004ASL 7 83 0.008 PET Based Sumiron Co, 38 μm Ltd.Sample 1-2 Urethane- MASTACK ZUPF- 10 83 0.016 PET Based 5001 50 μmFujimori Kogyo Co. Ltd. Sample 1-3 Acrylic EC-9000ASL 7 82 0.024 PETSumiron Co, 38 μm Ltd. Sample 1-4 Silicone- FIXFILM STD1 25 79 0.004 PETBased Fujicopian 25 μm Co. Ltd. Sample 1-5 Acrylic MASTACK PC- 4 82 0.04PET 542PA 50 μm Fujimori Kogyo Co. Ltd. Sample 1-6 Acrylic EC-625 — —0.1 Polyethylene Sumiron 55 μm (including Co, Ltd. Thickness ofProtective Sheet) Sample 1-7 Acrylic PP40-R-KG2 — — 0.2 PolypropyleneNichiei Kakoh 40 μm Co. Ltd. Sample 1-A Without Protective Sheet Sample1-B Coating Layer 1 1 — — without Self- Adsorption Sample 1-C CoatingLayer 0.5 1 — — without Self- Adsorption Laser Durability (Presence orPresence or Absence of Absence of Adsorption/Air Deformation of Burrsand Escape Ability Protective Sheet) Rubble Peelabiiity Sample 1-1OK/Remaining No Breakage None Excellent Air Cracks (Little) Sample 1-2OK/Remaining No Breakage None Excellent Air Cracks (Little) Sample 1-3OK/Remaining No Breakage None Damage on Air Cracks Resin Mask (Medium)(Little) Sample 1-4 OK/Remaining No Breakage None Excellent Air Cracks(None) Sample 1-5 OK/Remaining No Breakage Slight Burrs Damage on AirCracks and Rubble Resin Mask (Much) Arise (Little) Sample 1-6OK/Remaining — — Damage on Air Resin Mask (Little) (Medium) Sample 1-7OK/Remaining — — Damage on Air Resin Mask (Little) (Much) Sample 1-A — —Many Burrs — and Rubble Arise Sample 1-B — Cracks Slight BurrsDisability Arise in and Rubble of Peeling- Coating Arise Off LayerSample 1-C — Coating Slight Burrs Disability Layer and Rubble ofPeeling- Breaks Arise Off(Vapor Deposition Mask Produced by Method for Producing Vapor DepositionMask)

FIG. 9(a) is an elevation view of a vapor deposition mask produced bythe method for producing a vapor deposition mask according to eachembodiment of the present disclosure as seen from the metal mask side,and FIG. 9(b) is a schematic cross-sectional view taken along the A-Aline in FIG. 9(a).

While in the mode shown in the figure, the opening shape of the resinmask opening 25 exhibits a rectangular shape, the opening shape is notspecially limited but the opening shape of the resin mask opening 25 maybe rhombic or polygonal or may be a shape having a curvature such as acircle and an ellipsoid. Notably, it can be said that the rectangular orpolygonal opening shape is a preferable opening shape of the resin maskopening 25 in view of capability of securing a larger area of lightemission as compared with the opening shape having a curvature such as acircle and an ellipsoid.

(Resin Mask)

The material of the resin mask 20 is not limited but, for example, amaterial that enables formation of the resin mask openings 25 with highdefinition by laser processing or the like, includes a low rate ofdimensional change and a low rate of humidity absorption under heat andwith passage of time, and is light weight is preferably used. As suchmaterials, a polyimide resin, a polyamide resin, a polyamide-imideresin, a polyester resin, a polyethylene resin, a polyvinyl alcoholresin, a polypropylene resin, a polycarbonate resin, a polystyreneresin, a polyacrylonitrile resin, an ethylene-vinyl acetate copolymerresin, an ethylene-vinyl alcohol copolymer resin, anethylene-methacrylic acid copolymer resin, a polyvinyl chloride resin, apolyvinylidene chloride resin, cellophane, an ionomer resin and the likecan be cited. Among the materials exemplarily cited above, resinmaterials with the thermal expansion coefficients of about 16 ppm/° C.or less are preferable, resin materials with the rates of humidityabsorption of about 1.0% or less are preferable, and resin materialsincluding both conditions are particularly preferable. The resin maskusing these resin materials enables dimensional precision of the resinmask openings 25 to be improved and a rate of dimensional change and arate of humidity absorption under heat and with passage of time to besmall. Accordingly, as the resin plate 20A which is to be the resin mask20 in the final stage and constitutes the vapor deposition maskpreparation body, a resin plate constituted of a preferable resinmaterial, for example, exemplarily cited above is preferable used.

The thickness of the resin mask 20 is not specially limited but, in thecase of further improving the effect of suppressing generation of ashadow, the thickness of the resin mask 20 is preferably not more thanabout 25 μm, still preferably less than about 10 μm. A preferable rangeof the lower limit value is not specially limited but, in the case wherethe thickness of the resin mask 20 is less than about 3 μm, defects suchas a pinhole tend to arise and a risk of deformation or the likeincreases. In particular, by setting the thickness of the resin mask 20to be not less than about 3 μm and less than about 10 μm, stillpreferably not less than about 4 μm and not more than about 8 μm, theinfluence of a shadow in formation of a high definition patternexceeding 400 ppi can be more effectively prevented. Moreover, while theresin mask 20 may be directly bonded to the metal mask 10 mentionedlater or may be bonded thereto via a pressure-sensitive adhesive agentlayer, in the case where the resin mask 20 is bonded to the metal mask10 via the pressure-sensitive adhesive agent layer, the total thicknessof the resin mask 20 and the pressure-sensitive adhesive agent layer ispreferably within the aforementioned preferable thickness range.Notably, the shadow is a phenomenon that a part of a vapor depositionmaterial released from a vapor deposition source collides with innerwall surfaces of the metal mask opening of the metal mask and/or theresin mask opening of the resin mask and does not reach the vapordeposition target, and thereby, a portion without vapor deposition thathas a film thickness smaller than the intended vapor deposition filmthickness arises. Accordingly, the thickness of the resin plate 20Awhich is to be the resin mask 20 in the final stage and constitutes thevapor deposition mask preparation body is preferably the aforementionedthickness. Notably, while the resin plate 20A may be bonded to the metalmask 10 via a pressure-sensitive adhesive agent layer or an adhesiveagent layer, or the resin plate 20A may be directly bonded to the metalplate, in the case where the resin plate is bonded to the metal mask 10via the pressure-sensitive adhesive agent layer or the adhesive agentlayer, with the aforementioned shadow taken into consideration, thetotal thickness of the resin plate 20A and the pressure-sensitiveadhesive agent layer or the resin plate 20A and the adhesive agent layeris preferably set to be within the aforementioned preferable range.

The sectional shape of the resin mask opening 25 is not speciallylimited but end surfaces that face each other and are of the resin maskforming the resin mask openings 25 may be substantially parallel to eachother, but as shown in FIG. 9(b), the sectional shape of the resin maskopening 25 is preferably a shape including broadening toward a vapordeposition source. In other words, it preferably includes a tapersurface including broadening toward the metal mask 10 side. While ataper angle can be properly set with the thickness or the like of theresin mask 20 taken into consideration, an angle formed by a straightline connecting the lower bottom distal end in the resin mask opening ofthe resin mask and the upper bottom distal end of the resin mask openingof the same resin mask and the bottom surface of the resin mask, inother words, an angle formed by an inner wall surface of the resin maskopening 25 and a surface of the resin mask 20 on the side that is not incontact with the metal mask 10 (lower surface of the resin mask in themode shown in the drawings) in the thicknesswise cross section of theinner wall surface constituting the resin mask opening 25 of the resinmask 20 is preferably within a range not less than about 5° and not morethan about 85°, still preferably within a range not less than about 15°and not more than about 75°, further preferably within a range not lessthan about 25° and not more than about 65°. In particular, within thisrange, it is preferably an angle smaller than a vapor deposition angleof a vapor deposition machine to be used. Moreover, in the mode shown inthe drawings, while an end surface that forms the resin mask opening 25exhibits a linear shape, there is no limitation thereto but may be in acurved shape convex outward, in other words, a shape of the entirety ofthe resin mask opening 25 may be a bowl shape. Such a resin mask opening25 including the sectional shape can be formed by properly adjusting anirradiation position with laser in the occasion when the resin maskopening 25 is formed in the resin plate 20A and irradiation energy ofthe laser, or by performing multi-stage laser irradiation in which theirradiation position is changed in stages.

(Metal Mask)

As shown in FIG. 9(b), the metal mask 10 is stacked on one surface ofthe resin mask 20. The metal mask 10 is constituted of metal, in whichthe metal mask openings 15 extending in the lengthwise direction or thecrosswise direction are arranged. The metal mask opening 15 issynonymous with an opening and sometimes referred to as slit. Anarrangement example of the metal mask openings is not specially limitedbut the metal mask openings extending in the lengthwise direction andthe crosswise direction may be arranged in a plurality of rows in thelengthwise direction and the crosswise direction, the metal maskopenings extending in the lengthwise direction may be arranged in aplurality of rows in the crosswise direction, and the metal maskopenings extending in the crosswise direction may be arranged in aplurality of rows in the lengthwise direction. Moreover, they may bearranged in only one row in the lengthwise direction or the crosswisedirection. Notably, “lengthwise direction” and “crosswise direction”stated in the specification of the present application indicate thevertical direction and the horizontal direction in the drawings,respectively, and may be any directions of the longitudinal directionsand the width directions of the vapor deposition mask, the resin maskand the metal mask. For example, the longitudinal direction of the vapordeposition mask, the resin mask or the metal mask may be set to be the“lengthwise direction”, or the width direction thereof may be set to bethe “lengthwise direction”. Moreover, while in the specification of thepresent application, the case where the shape of the vapor depositionmask in plan view is a rectangular shape is exemplarily described, itmay be another shape such, for example, as a circular shape and apolygonal shape such as a rhombic shape. In this case, the longitudinaldirection of the diagonal line, the radial direction, or any directiononly has to be set as the “longitudinal direction”, the directionperpendicular to the “longitudinal direction” being set as the “widthdirection (sometimes referred to as short-side direction)”.

The material of the metal mask 10 is not specially limited but aconventionally known one in the field of the vapor deposition mask canbe properly selected and used, and, for example, metal materials such asstainless steel, iron-nickel alloy and aluminum alloy can be cited.Above all, an invar material which is iron-nickel alloy can bepreferably used since an invar material is hardly deformed by heat.

While the thickness of the metal mask 10 is not specially limited but,in order to more effectively prevent generation of a shadow, ispreferably not more than about 100 μm, still preferably not more thanabout 50 μm, particularly preferably not more than about 35 μm. Notably,in the case of being thinner than about 5 μm, risks of rupture anddeformation tend to increase and handling tends to be difficult.

Moreover, while in the mode shown in FIG. 9(a), the opening shape of themetal mask opening 15 in plan view exhibits a rectangular shape, theopening shape is not specially limited but the opening shape of themetal mask opening 15 may be any shape such as a trapezoid and a circle.

The sectional shape of the metal mask opening 15 formed in the metalmask 10 is not specially limited but, as shown in FIG. 9(b), ispreferably a shape including broadening toward a vapor depositionsource. More specifically, an angle formed by a straight line connectingthe lower bottom distal end in the metal mask opening 15 of the metalmask 10 and the upper bottom distal end in the metal mask opening 15 ofthe same metal mask 10 and the bottom surface of the metal mask 10, inother words, an angle formed by an inner wall surface of the metal maskopening 15 and a surface of the metal mask 10 on the side that is incontact with the resin mask 20 (lower surface of the metal mask in themode shown in the figure) in the thicknesswise cross section of theinner wall surface constituting the metal mask opening 15 of the metalmask 10 is preferably within a range not less than about 5° and not morethan about 85°, still preferably within a range not less than about 15°and not more than about 80°, further preferably within a range not lessthan about 25° and not more than about 65°. In particular, within thisrange, it is preferably an angle smaller than a vapor deposition angleof a vapor deposition machine to be used.

Hereafter, vapor deposition masks in preferable modes produced by themethods for producing a vapor deposition mask according to embodimentsof the present disclosure are described, exemplified by Embodiment (A)and Embodiment (B).

<Vapor Deposition Mask of Embodiment (A)>

As shown in FIG. 10, the vapor deposition mask 100 of Embodiment (A) isa vapor deposition mask for simultaneously forming vapor depositionpatterns for a plurality of screens, and includes the metal mask 10 inwhich the plurality of metal mask openings 15 are provided and the resinmask 20, the metal mask being stacked on one surface of the resin mask,wherein the resin mask openings 25 needed for constituting the pluralityof screens are provided in the resin mask 20, and each metal maskopening 15 is provided at a position overlapping with the entirety of atleast one screen.

The vapor deposition mask 100 of Embodiment (A) is a vapor depositionmask used for simultaneously forming vapor deposition patterns for aplurality of screens, and one vapor deposition mask 100 cansimultaneously form vapor deposition patterns compatible with aplurality of products. “Resin mask openings” stated for the vapordeposition mask of Embodiment (A) mean the pattern(s) to be producedusing the vapor deposition mask 100 of Embodiment (A). For example, whenthe vapor deposition mask is used for forming an organic layer in anorganic EL display, the shape of the resin mask openings 25 is the shapeof the organic layer. Moreover, “one screen” is constituted of anaggregate of the resin mask openings 25 corresponding to one product,and when the one product is an organic EL display, an aggregate oforganic layers needed for forming the one organic EL display, in otherwords, an aggregate of resin mask openings 25 to be the organic layersis “one screen”. Further, in the vapor deposition mask 100 of Embodiment(A), in order to simultaneously form the vapor deposition patterns forthe plurality of screens, the aforementioned “one screen” is arrangedfor each of the plurality of screens in the resin mask 20 atpredetermined intervals. Namely, in the resin mask 20, the resin maskopenings 25 needed for constituting the plurality of screens areprovided.

The vapor deposition mask of Embodiment (A) includes the metal mask 10in which the plurality of metal mask openings 15 are provided and theresin mask, the metal mask being provided on one surface of the resinmask, wherein each metal mask opening 15 is provided at a positionoverlapping with the entirety of at least one screen. In other words,between the resin mask openings 25 needed for constituting one screen,metal line portions that include the same length as the length of themetal mask opening 15 in the lengthwise direction and include the samethickness as that of the metal mask 10 between the resin mask openings25 adjacent in the crosswise direction, or metal line portions thatinclude the same length as the length of the metal mask opening 15 inthe crosswise direction and include the same thickness as that of themetal mask 10 between the resin mask openings 25 adjacent in thelengthwise direction do not exist. Hereafter, the metal line portionsthat include the same length as the length of the metal mask opening 15in the lengthwise direction and include the same thickness as that ofthe metal mask 10 and the metal line portions that include the samelength as the length of the metal mask opening 15 in the crosswisedirection and include the same thickness as that of the metal mask 10are sometimes collectively referred to simply as metal line portions.

According to the vapor deposition mask 100 of Embodiment (A), even whenthe dimension of the resin mask openings 25 needed for constituting onescreen and the pitch between the resin mask openings 25 constituting onescreen are made small, for example, even when the dimension of the resinmask openings 25 and the pitch between the resin mask openings 25 aremade extremely fine in order to form a screen exceeding 400 ppi,interference due to metal line portions can be prevented and an imagewith high definition can be formed. Notably, when one screen is dividedby a plurality of metal mask openings, in other words, when the metalline portions including the same thickness as that of the metal mask 10exist between the resin mask openings 25 constituting one screen, as thepitch between the resin mask openings 25 constituting one screen becomessmaller, the metal line portions existing between the resin maskopenings 25 more become a hindrance in forming a vapor depositionpattern on a vapor deposition target and the vapor deposition patternwith high definition becomes more difficult to be formed. In otherwords, when the metal line portions including the same thickness as thatof the metal mask 10 exist between the resin mask openings 25constituting one screen, the metal line portions cause generation of ashadow when setting the frame-equipped vapor deposition mask, whichresults in difficulty of formation of a screen with high definition.

Next, referring to FIG. 10 to FIG. 13(b), the resin mask openings 25constituting one screen are exemplarily described. Notably, a regionenclosed by a broken line in the modes shown in the figures is onescreen. While in the modes shown in the figures, an aggregate of a smallnumber of resin mask openings 25 is one screen for convenience ofdescription, but not limited to these modes, for example, the resin maskopenings 25 for millions of pixels may exist in one screen, where oneresin mask opening 25 is one pixel.

In the mode shown in FIG. 10, one screen is constituted of an aggregate,of resin mask openings 25, in which a plurality of resin mask openings25 are provided in the lengthwise direction and the crosswise direction.In the mode shown in FIG. 11, one screen is constituted of an aggregate,of resin mask openings 25, in which a plurality of resin mask openings25 are provided in the crosswise direction. Moreover, in the mode shownin FIG. 12, one screen is constituted of an aggregate, of resin maskopenings 25, in which a plurality of resin mask openings 25 are providedin the lengthwise direction. Further, in FIG. 10 to FIG. 12, the metalmask opening 15 is provided at a position overlapping with the entiretyof one screen.

As described above, the metal mask opening 15 may be provided at aposition overlapping with only one screen, or as shown in FIGS. 13(a)and 13(b), may be provided at a position overlapping with the entiretyof two or more screens. In FIG. 13(a), in the vapor deposition mask 100shown in FIG. 10, the metal mask opening 15 is provided at a positionoverlapping with the entirety of two screens continuous in the crosswisedirection. In FIG. 13(b), the metal mask opening 15 is provided at aposition overlapping with the entirety of three screens continuous inthe lengthwise direction.

Next, exemplified by the mode shown in FIG. 10, pitches between theresin mask openings 25 constituting one screen and pitches between thescreens are described. The pitches between the resin mask openings 25constituting one screen and the dimension of the resin mask opening 25are not specially limited but can be properly set depending on a patternto be produced by vapor deposition. For example, when forming a vapordeposition pattern with high definition of 400 ppi, a pitch (P1) in thecrosswise direction and a pitch (P2) in the lengthwise direction betweenthe adjacent resin mask openings 25 out of the resin mask openings 25constituting one screen are about 60 μm. Moreover, the dimension of theresin mask opening is within a range not less than about 500 μm² and notmore than about 1000 μm². Moreover, one resin mask opening 25 is notlimited to correspond to one pixel but, for example, a plurality ofpixels can also be collectively one resin mask opening 25 depending on apixel arrangement.

While a pitch (P3) in the crosswise direction and a pitch (P4) in thelengthwise direction between the screens are not specially limited but,as shown in FIG. 10, when one metal mask opening 15 is provided at theposition overlapping with the entirety of one screen, metal lineportions are to exist between the screens. Accordingly, when the pitch(P4) in the lengthwise direction and the pitch (P3) in the crosswisedirection between the screens are smaller than or substantially equal tothe pitch (P2) in the lengthwise direction and the pitch (P1) in thecrosswise direction of the resin mask openings 25 provided in onescreen, the metal line portions existing between the screens are liableto break. Accordingly, with this point taken into consideration, thepitch (P3, P4) between the screens is preferably wider than the pitch(P1, P2) between the resin mask openings 25 constituting one screen. Thepitch (P3, P4) between the screens is exemplarily within a range notless than about 1 mm and not more than about 100 mm. Notably, the pitchbetween the screens means the pitch between the adjacent resin maskopenings in one screen and another screen adjacent to the one screen.The same holds true for the pitch between the resin mask openings 25 andthe pitch between the screens in the vapor deposition mask of Embodiment(B) mentioned later.

Notably, as shown in FIGS. 13(a)-(b), when one metal mask opening 15 isprovided at the position overlapping with the entirety of two or morescreens, metal line portions constituting the inner wall surfaces of themetal mask opening are not to exist between the plurality of screensprovided in the one metal mask opening 15. Accordingly, in this case,the pitch between the two or more screens provided at the positionoverlapping with the one metal mask opening 15 may be substantiallyequal to the pitch between the resin mask openings 25 constituting onescreen.

Moreover, on the resin mask 20, grooves (not shown) extending in thelengthwise direction or the crosswise direction of the resin mask 20 maybe formed. While in the case of application of heat in vapor deposition,there is a possibility that the resin mask 20 undergoes thermalexpansion, and thereby, changes in dimension and position of the resinmask opening 25 arise, by forming the grooves, they can absorb theexpansion of the resin mask, and can prevent the changes in dimensionand position of the resin mask opening 25 caused by the resin mask 20expanding in a predetermined direction as a whole due to accumulation ofthermal expansions arising in portions in the resin mask. Formationpositions of the grooves are not limited but they may be providedbetween the resin mask openings 25 constituting one screen and atpositions overlapping with the resin mask openings 25, but they arepreferably provided between the screens. Moreover, the grooves may beprovided on one surface of the resin mask, for example, only on thesurface on the side that is in contact with the metal mask, or may beprovided only on the surface on the side that is not in contact with themetal mask. Otherwise, they may be provided on both surfaces of theresin mask 20.

Moreover, the grooves extending in the lengthwise direction may bebetween the adjacent screens, or the grooves extending in the crosswisedirection may be formed between the adjacent screens. Furthermore, thegrooves can also be formed in a mode combining these.

The depth and the width of the grooves are not specially limited but,since the rigidity of the resin mask 20 tends to decrease in the casewhere the depth of the grooves is too large and in the case where thewidth thereof is too large, they are needed to be set with this pointtaken into consideration. Moreover, the sectional shape of the groovesis not specially limited but only has to be arbitrarily selected as aU-shape, a V-shape or the like with the processing method and the liketaken into consideration. The same holds true for the vapor depositionmask of Embodiment (B).

<Vapor Deposition Mask of Embodiment (B)>

Next, a vapor deposition mask of Embodiment (B) is described. As shownin FIG. 14, a vapor deposition mask of Embodiment (B) includes the metalmask 10 in which one metal mask opening (one hole 16) is provided andthe resin mask 20 in which the plurality of resin mask openings 25corresponding to a pattern to be produced by vapor deposition areprovided, the metal mask being stacked on one surface of the resin mask,wherein all of the plurality of resin mask openings 25 are provided at aposition overlapping with the one hole provided in the metal mask 10.

The resin mask openings 25 stated for the vapor deposition mask ofEmbodiment (B) mean resin mask openings needed for forming a vapordeposition pattern on a vapor deposition target, and resin mask openingsnot needed for forming the vapor deposition pattern on the vapordeposition target may be provided at a position not overlapping with theone hole 16. Notably, FIG. 14 is an elevation view which exemplarilyshows the vapor deposition mask of Embodiment (B) and is of the vapordeposition mask as seen from the metal mask side.

In the vapor deposition mask 100 of Embodiment (B), the metal mask 10including the one hole 16 is provided on the resin mask 20 including theplurality of resin mask openings 25, and all of the plurality of resinmask openings 25 are provided at a position overlapping with the onehole 16. In the vapor deposition mask 100 of Embodiment (B) with thisconfiguration, metal line portions that include the same thickness asthe thickness of the metal mask or a larger thickness than the thicknessof the metal mask do not exist between the resin mask openings 25.Hence, as described for the aforementioned vapor deposition mask ofEmbodiment (A), a vapor deposition pattern with high definition can beformed to match the dimensions of the resin mask openings 25 provided inthe resin mask 20 without suffering interference of metal line portions.

Moreover, according to the vapor deposition mask of Embodiment (B),there is almost no influence of a shadow even when the thickness of themetal mask 10 is made large. Hence, the thickness of the metal mask 10can be made larger to such an extent that durability and handlingability are sufficiently satisfied. Durability and handling ability canbe improved while enabling formation of a vapor deposition pattern withhigh definition.

The resin mask 20 in the vapor deposition mask of Embodiment (B) isconstituted of resin, in which as shown in FIG. 14, the plurality ofresin mask openings 25 corresponding to a pattern to be produced byvapor deposition are provided at a position overlapping with the onehole 16. The resin mask openings 25 correspond to the pattern to beproduced by vapor deposition, and by a vapor deposition material whichis released from a vapor deposition source passing through the resinmask openings 25, the vapor deposition pattern corresponding to theresin mask openings 25 is formed on the vapor deposition target.Notably, while in the mode shown in the figure, the resin mask openingsarranged in a plurality of rows in the lengthwise direction and thecrosswise direction are exemplarily described, they may be arranged onlyin the lengthwise direction or in the crosswise direction.

“One screen” in the vapor deposition mask 100 of Embodiment (B) means anaggregate of resin mask openings 25 corresponding to one product, andwhen the one product is an organic EL display, an aggregate of organiclayers needed for forming one organic EL display, in other words, anaggregate of resin mask openings 25 to be the organic layers is “onescreen”. While the vapor deposition mask of Embodiment (B) may beconstituted of only “one screen” or may be provided by arranging the“one screen” for each of a plurality of screens, in the case where the“one screen” is arranged for each of the plurality of screens, the resinmask openings 25 are preferably provided at predetermined intervals on ascreen-by-screen basis (refer to FIG. 10 for the vapor deposition maskof Embodiment (A)). The mode of “one screen” is not specially limitedbut, for example, the one screen can also be constituted of millions ofresin mask openings 25, where one resin mask opening 25 is one pixel.

The metal mask 10 in the vapor deposition mask 100 of Embodiment (B) isconstituted of metal and includes the one hole 16. Further, in anembodiment of the present invention, the one hole 16 is disposed at aposition overlapping with all of the resin mask openings 25 as seenhead-on of the metal mask 10, in other words, at a position where all ofthe resin mask openings 25 arranged in the resin mask 20 can be seen.

The metal portion constituting the metal mask 10, that is, the portionthereof other than the one hole 16 may be provided along the outer edgeof the vapor deposition mask 100 as shown in FIG. 14, or the dimensionof the metal mask 10 may be made smaller than that of the resin mask 20to expose an outer circumferential portion of the resin mask 20 as shownin FIG. 15. Moreover, the dimension of the metal mask 10 may be madelarger than that of the resin mask 20, so that a part of the metalportion is caused to protrude outward in the crosswise direction of theresin mask or outward in the lengthwise direction thereof. Notably, inany cases, the dimension of the one hole 16 is configured to be smallerthan the dimension of the resin mask 20.

While a width (W1), in the crosswise direction, and a width (W2), in thelengthwise direction, of the metal portion constituting the wall surfaceof the one hole 16 of the metal mask 10 shown in FIG. 14 are notspecially limited but, as the width W1, W2 is made smaller, durabilityand handling ability tend to deteriorate more. Accordingly, W1 and W2are preferably widths by which durability and handling ability aresufficiently satisfied. While appropriate widths can be properly setdepending on the thickness of the metal mask 10, as an example ofpreferable widths, both W1 and W2 are within a range of not less thanabout 1 mm and not more than about 100 mm, which are similar to thosefor the metal mask in the vapor deposition mask of Embodiment (A).

Accordingly, in the method for producing a vapor deposition maskaccording to an embodiment of the present disclosure, the position wherethe protective sheet 30 is provided on the other surface of the resinplate 20A, irradiation with laser light in the step of forming the resinmask openings 25, and the like are preferably determined such that thevapor deposition mask produced in the final stage is in the preferablemode described above. Moreover, when the protective sheet 30 is providedon the other surface of the resin plate 20A, the dimension thereof, andthe position where it is disposed are preferably determined such thatthe vapor deposition mask produced in the final stage is in thepreferable mode described above.

Moreover, in the method for producing a vapor deposition mask accordingto another embodiment of the present disclosure, the position where theprotective sheet 30 is adsorbed on the other surface of the resin plate20A, irradiation with laser light in the step of forming the resin maskopenings 25, and the like are preferably determined such that the vapordeposition mask produced in the final stage is in the preferable modedescribed above. Moreover, when the protective sheet 30 is adsorbed onthe other surface of the resin plate 20A, the dimension thereof, and theposition where it is adsorbed are preferably determined such that thevapor deposition mask produced in the final stage is in the preferablemode described above.

Moreover, using the method for producing a vapor deposition maskaccording to an embodiment of the present disclosure or the method forproducing a vapor deposition mask according to another embodiment of thepresent disclosure, a frame-equipped vapor deposition mask can also beobtained. FIG. 16 and FIG. 17 are elevation views of frame-equippedvapor deposition masks 200 obtained by fixing the vapor deposition masksobtained by the method for producing a vapor deposition mask accordingto an embodiment of the present disclosure and the method for producinga vapor deposition mask according to another embodiment of the presentdisclosure to frames 40 as seen from the resin mask side. In theframe-equipped vapor deposition mask 200, one vapor deposition mask 100may be fixed to the frame 40 as shown in FIG. 16, or a plurality ofvapor deposition masks 100 may be fixed to the frame 40 as shown in FIG.17. The frame-equipped vapor deposition mask 200 can be obtained byfixing the vapor deposition mask obtained by the method for producing avapor deposition mask according to an embodiment of the presentdisclosure or the method for producing a vapor deposition mask accordingto another embodiment of the present disclosure to the frame 40, or canbe obtained by beforehand fixing the vapor deposition mask preparationbody to the frame 40. Moreover, the frame-equipped vapor deposition maskin the mode shown in FIG. 17 can be obtained by fixing a plurality ofvapor deposition masks obtained by the method for producing a vapordeposition mask according to an embodiment of the present disclosure orthe method for producing a vapor deposition mask according to anotherembodiment of the present disclosure to the frame 40, or can be obtainedby beforehand fixing a plurality of vapor deposition mask preparationbodies 60 to the frame 40.

<<Vapor Deposition Mask Preparation Body>>

Next, a vapor deposition mask preparation body according to anembodiment of the present disclosure is described. The vapor depositionmask preparation body according to an embodiment of the presentdisclosure is used for obtaining a vapor deposition mask including ametal mask in which a metal mask opening is formed and a resin mask inwhich a resin mask opening corresponding to a pattern to be produced byvapor deposition is formed at a position overlapping with the metal maskopening, the metal mask and the resin mask being stacked, wherein themetal mask 10 is provided on one surface of the resin plate 20A forobtaining the resin mask 20, and a protective sheet with peel strengthnot less than about 0.0004 N/10 mm and less than about 0.2 N/10 mm inconformity with JIS Z-0237:2009 is provided on the other surface of theresin plate 20A. The vapor deposition mask preparation body according toan embodiment of the present disclosure corresponds to the vapordeposition mask preparation body 60 (refer to FIG. 1(a)) described for“Step of Preparing Vapor Deposition Mask Preparation Body” in theaforementioned method for producing a vapor deposition mask according toan embodiment of the present disclosure, and its detailed description isomitted. According to the vapor deposition mask preparation body 60according to an embodiment of the present disclosure, after the resinmask openings 25 are formed in the resin plate 20A of this vapordeposition mask preparation body 60 to obtain the resin mask 20, theprotective sheet 30 is peeled off and removed from the resin mask 20,and thereby, the vapor deposition masks in various modes described abovecan be obtained.

A modification of the vapor deposition mask preparation body accordingto an embodiment of the present disclosure (hereinafter referred to asvapor deposition mask preparation body of a modification) is used,similarly to the aforementioned vapor deposition mask preparation bodyaccording to an embodiment of the present disclosure, for obtaining avapor deposition mask including a metal mask in which a metal maskopening is formed and a resin mask in which a resin mask openingcorresponding to a pattern to be produced by vapor deposition is formedat a position overlapping with the metal mask opening, the metal maskand the resin mask being stacked, wherein the metal plate 10A forobtaining the metal mask 10 is provided on one surface of the resinplate 20A for obtaining the resin mask 20, and a protective sheet withpeel strength not less than about 0.0004 N/10 mm and less than about 0.2N/10 mm in conformity with JIS Z-0237:2009 is provided on the othersurface of the resin plate 20A. In other words, the vapor depositionmask preparation body 60 of a modification is different from theaforementioned vapor deposition mask preparation body according to anembodiment of the present disclosure only in that, in place of the metalmask 10 in which the metal mask openings 15 are formed, the metal plate10A before the metal mask openings 15 are formed is provided on the onesurface of the resin plate 20A. According to the vapor deposition maskpreparation body of a modification, after the metal mask openings areformed in the metal plate 10A of this vapor deposition mask preparationbody to obtain the metal mask 10, and after the resin mask openings 25are formed by irradiating the resin plate 20A with laser light throughthe metal mask openings 15 having been formed from the metal mask 10side to obtain the resin mask 20, the protective sheet 30 is peeled offand removed from the resin mask 20, and thereby, the vapor depositionmasks in various modes described above are obtained.

According to the vapor deposition mask preparation body according to anembodiment of the present disclosure described above, when the resinmask openings 25 are formed in the resin plate 20A with laser light,“burrs” and “rubble” can be suppressed from arising on the formed resinmask 20, and a vapor deposition mask including the resin mask 20 inwhich the resin mask openings 25 with high definition are formed and themetal mask 10 including the metal mask openings 15, the resin mask andthe metal mask being stacked, can be obtained.

A vapor deposition mask preparation body according to another embodimentof the present disclosure is used for obtaining a vapor deposition maskincluding a metal mask in which a metal mask opening is formed and aresin mask in which a resin mask opening corresponding to a pattern tobe produced by vapor deposition is formed at a position overlapping withthe metal mask opening, the metal mask and the resin mask being stacked,wherein the metal mask 10 is provided on one surface of the resin plate20A for obtaining the resin mask 20, and the protective sheet 30 withself-adsorption and peelability is adsorbed on the other surface of theresin plate 20A. The vapor deposition mask preparation body according toanother embodiment of the present disclosure corresponds to the vapordeposition mask preparation body 60 (refer to FIG. 1(a)) described for“Step of Preparing Vapor Deposition Mask Preparation Body” in theaforementioned method for producing a vapor deposition mask according toanother embodiment of the present disclosure, and its detaileddescription is omitted. According to the vapor deposition maskpreparation body 60 according to another embodiment of the presentdisclosure, after the resin mask openings 25 are formed in the resinplate 20A of this vapor deposition mask preparation body 60 to obtainthe resin mask 20, the protective sheet 30 is peeled off and removedfrom the resin mask 20, and thereby, the vapor deposition masks invarious modes described above can be obtained.

A modification of the vapor deposition mask preparation body accordingto another embodiment of the present disclosure (hereinafter referred toas vapor deposition mask preparation body of another modification) isused, similarly to the aforementioned vapor deposition mask preparationbody according to another embodiment of the present disclosure, forobtaining a vapor deposition mask including a metal mask in which ametal mask opening is formed and a resin mask in which a resin maskopening corresponding to a pattern to be produced by vapor deposition isformed at a position overlapping with the metal mask opening, the metalmask and the resin mask being stacked, wherein the metal plate 10A forobtaining the metal mask 10 is provided on one surface of the resinplate 20A for obtaining the resin mask 20, and the protective sheet 30with self-adsorption and peelability is adsorbed on the other surface ofthe resin plate 20A. In other words, the vapor deposition maskpreparation body 60 of another modification is different from theaforementioned vapor deposition mask preparation body according toanother embodiment of the present disclosure only in that, in place ofthe metal mask 10 in which the metal mask openings 15 are formed, themetal plate 10A before the metal mask openings 15 are formed is providedon the one surface of the resin plate 20A. According to the vapordeposition mask preparation body of another modification, after themetal mask openings are formed in the metal plate 10A of this vapordeposition mask preparation body to obtain the metal mask 10, and afterthe resin mask openings 25 are formed by irradiating the resin plate 20Awith laser light through the metal mask openings 15 having been formedfrom the metal mask 10 side to obtain the resin mask 20, the protectivesheet 30 is peeled off and removed from the resin mask 20, and thereby,the vapor deposition masks in various modes described above areobtained.

According to the vapor deposition mask preparation body according toanother embodiment of the present disclosure described above, when theresin mask openings 25 are formed in the resin plate 20A with laserlight, “burrs” and “rubble” can be suppressed from arising on the formedresin mask 20, and a vapor deposition mask including the resin mask 20in which the resin mask openings 25 with high definition are formed andthe metal mask 10 including the metal mask openings 15, the resin maskand the metal mask being stacked, can be obtained.

<<Vapor Deposition Mask>>

Next, a vapor deposition mask according to an embodiment of the presentdisclosure is described. In the vapor deposition mask 100 according toan embodiment of the present disclosure, the metal mask 10 including themetal mask openings 15 is provided on one surface of the resin mask 20including the resin mask openings 25, and a protective sheet 30 withpeel strength not less than about 0.0004 N/10 mm and less than about 0.2N/10 mm in conformity with JIS Z-0237:2009 is provided on the othersurface of the resin mask 20 (refer to FIG. 19).

This vapor deposition mask 100 according to an embodiment of the presentdisclosure and the aforementioned vapor deposition mask preparation bodyaccording to an embodiment of the present disclosure have all in commonexcept the resin mask 20 including the resin mask openings 25 in placeof the resin plate 20A, and its detailed description is omitted.

Moreover, as shown in FIG. 19, in a vapor deposition mask according toanother embodiment of the present disclosure, the metal mask 10including the metal mask openings 15 is provided on one surface of theresin mask 20 including the resin mask openings 25, and the protectivesheet 30 with self-adsorption and peelability is adsorbed on the othersurface of the resin mask 20.

This vapor deposition mask according to another embodiment of thepresent disclosure and the aforementioned vapor deposition maskpreparation body according to another embodiment of the presentdisclosure have all in common except the resin mask 20 including theresin mask openings 25 in place of the resin plate 20A, and its detaileddescription is omitted.

<<Method for Producing Organic Semiconductor Element>>

Next, a method for producing an organic semiconductor element accordingto an embodiment of the present disclosure is described. The method forproducing an organic semiconductor element according to an embodiment ofthe present disclosure includes a step of forming a vapor depositionpattern on a vapor deposition target using a frame-equipped vapordeposition mask in which a vapor deposition mask is fixed to a frame,wherein in the step of forming the vapor deposition pattern, the vapordeposition mask fixed to the frame is the vapor deposition mask producedby the method for producing a vapor deposition mask according to anembodiment of the present disclosure described above.

Moreover, a method for producing an organic semiconductor elementaccording to another embodiment of the present disclosure includes astep of forming a vapor deposition pattern on a vapor deposition targetusing a frame-equipped vapor deposition mask in which a vapor depositionmask is fixed to a frame, wherein in the step of forming the vapordeposition pattern, the vapor deposition mask fixed to the frame is thevapor deposition mask produced by the method for producing a vapordeposition mask according to another embodiment of the presentdisclosure described above.

The method for producing an organic semiconductor element according toan embodiment of the present disclosure and the method for producing anorganic semiconductor element according to another embodiment of thepresent disclosure, each of which includes the step of forming the vapordeposition pattern by a vapor deposition method using the frame-equippedvapor deposition mask, include an electrode forming step, an organiclayer forming step, a counter electrode forming step, a sealing layerforming step and the like in which electrodes are formed on a substrate,and in any of the steps, a vapor deposition pattern is formed on thesubstrate by the vapor deposition method using the frame-equipped vapordeposition mask. For example, in the case where the vapor depositionmethod using the frame-equipped vapor deposition mask is applied to eachof light-emitting layer forming steps for colors of R (red), G (green)and B (blue) in an organic EL device, vapor deposition patterns areformed for light-emitting layers for the colors on the substrate.Notably, the method for producing an organic semiconductor elementaccording to an embodiment of the present disclosure and the method forproducing an organic semiconductor element according to anotherembodiment of the present disclosure are not limited to be applied tothese steps, but to any steps in conventionally known production of anorganic semiconductor element using a vapor deposition method.

In the method for producing an organic semiconductor element accordingto an embodiment of the present disclosure and the method for producingan organic semiconductor element according to another embodiment of thepresent disclosure, the frame-equipped vapor deposition mask which isused in the aforementioned step of forming the vapor deposition patternand in which the vapor deposition mask is fixed to the frame is thevapor deposition mask produced by the method for producing a vapordeposition mask according to an embodiment of the present disclosure orthe method for producing a vapor deposition mask according to anotherembodiment of the present disclosure described above, and its detaileddescription is omitted. According to the method for producing a vapordeposition mask according to an embodiment of the present disclosure andthe method for producing a vapor deposition mask according to anotherembodiment of the present disclosure, a vapor deposition mask includingthe resin mask 20 in which the resin mask openings 25 corresponding to apattern to be produced by vapor deposition are formed with excellentprecision can be obtained, and hence, according to the method forproducing an organic semiconductor element using the frame-equippedvapor deposition mask in which this vapor deposition mask is fixed tothe frame, an organic semiconductor element including a high definitionpattern can be formed. As organic semiconductor elements produced by themethod for producing an organic semiconductor element according to anembodiment of the present disclosure and the method for producing anorganic semiconductor element according to another embodiment of thepresent disclosure, for example, organic layers, light-emitting layers,cathode electrodes and the like of organic EL elements can be cited. Inparticular, the method for producing an organic semiconductor elementaccording to an embodiment of the present disclosure can be preferablyused for production of R (red), G (green) and B (blue) light-emittinglayers of organic EL elements which require pattern precision with highdefinition.

<<Method for Producing Organic EL Display>>

Next, a method for producing an organic EL display (organicelectroluminescence display) according to an embodiment of the presentdisclosure (hereinafter referred to as method for producing an organicEL display according to the present disclosure) is described. In themethod for producing an organic EL display according to the presentdisclosure, the organic semiconductor element produced by the method forproducing an organic semiconductor element according to the presentdisclosure described above is used in a step of producing the organic ELdisplay.

Moreover, in a method for producing an organic EL display according toanother embodiment of the present disclosure, the organic semiconductorelement produced by the method for producing an organic semiconductorelement according to another embodiment of the present disclosuredescribed above is used in a step of producing the organic EL display.

As the organic EL displays in which the organic semiconductor elementsproduced by the aforementioned method for producing an organicsemiconductor element according to the present disclosure and the methodfor producing an organic EL display according to another embodiment ofthe present disclosure are used, for example, organic EL displays usedfor a notebook-sized personal computer (refer to FIG. 18(a)), a tabletterminal (refer to FIG. 18(b)), a mobile phone (refer to FIG. 18(c)), asmartphone (refer to FIG. 18(d)), a video camera (refer to FIG. 18(e)),a digital camera (refer to FIG. 18(f)), a smartwatch (refer to FIG.18(g)) and the like can be cited.

REFERENCE SIGNS LIST

-   100 Vapor deposition mask-   10A Metal plate-   10 Metal mask-   15 Metal mask opening-   20A Resin plate-   20 Resin mask-   30 Protective sheet-   25 Resin mask opening-   60 Vapor deposition mask preparation body-   62 Resist material-   64 Resist pattern

The invention claimed is:
 1. A method for producing a vapor depositionmask including a metal mask in which a metal mask opening is formed anda resin mask in which a resin mask opening corresponding to a pattern tobe produced by vapor deposition is formed at a position overlapping withthe metal mask opening, the metal mask and the resin mask being stacked,the method comprising: a step of preparing a vapor deposition maskpreparation body in which the metal mask is provided on one surface of aresin plate for obtaining the resin mask, and a protective sheet withself-adsorption and peelability is adsorbed on the other surface of theresin plate; a step of irradiating, with respect to the vapor depositionmask preparation body, the resin plate with laser light from the metalmask side to form the resin mask opening corresponding to the pattern tobe produced by vapor deposition in the resin plate; and a step ofpeeling off the protective sheet from the resin mask in which the resinmask opening corresponding to the pattern to be produced by vapordeposition is formed.
 2. The method for producing a vapor depositionmask according to claim 1, wherein the protective sheet adsorbed on theother surface of the resin plate is a protective sheet containing anyone or both of a silicone-based resin and a urethane-based resin.
 3. Themethod for producing a vapor deposition mask according to claim 1,wherein the vapor deposition mask preparation body is a vapor depositionmask preparation body in which the metal mask is provided on one surfaceof the resin plate for obtaining the resin mask, and a plurality of theprotective sheets are adsorbed on the other surface of the resin plate.4. The method for producing a vapor deposition mask according to claim2, wherein the vapor deposition mask preparation body is a vapordeposition mask preparation body in which the metal mask is provided onone surface of the resin plate for obtaining the resin mask, and aplurality of the protective sheets are adsorbed on the other surface ofthe resin plate.
 5. The method for producing a vapor deposition maskaccording to claim 1, wherein the resin plate is made of a resinmaterial having a thermal expansion coefficient of 16 ppm/° C. or less.6. The method for producing a vapor deposition mask according to claim1, wherein the resin plate is made of a resin material having a rate ofhumidity absorption of 1.0% or less.
 7. The method for producing a vapordeposition mask according to claim 1, wherein the resin plate is made ofa resin material having a thermal expansion coefficient of 16 ppm/° C.or less and a rate of humidity absorption of 1.0% or less.
 8. The methodfor producing a vapor deposition mask according to claim 1, wherein athickness of the resin plate is 3 μm to 25 μm inclusive.
 9. The methodfor producing a vapor deposition mask according to claim 1, wherein athickness of the resin plate is 4 μm to 8 μm inclusive.
 10. The methodfor producing a vapor deposition mask according to claim 1, wherein thepattern is a high-definition pattern exceeding 400 ppi.
 11. The methodfor producing a vapor deposition mask according to claim 1, wherein across-sectional shape of the resin mask opening broadens toward themetal mask side.
 12. The method for producing a vapor deposition maskaccording to claim 1, wherein a thickness of the metal mask is 5 μm to100 μm inclusive.
 13. The method for producing a vapor deposition maskaccording to claim 1, wherein a thickness of the metal mask is 5 μm to35 μm inclusive.
 14. The method for producing a vapor deposition maskaccording to claim 1, wherein the metal mask is made of an invarmaterial.
 15. The method for producing a vapor deposition mask accordingto claim 1, wherein a cross-sectional shape of the metal mask openingbroadens toward a vapor deposition source.